2012
DOI: 10.1002/adma.201200539
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A Membrane Device for Substrate‐Free Photovoltaic Characterization of Quantum Dot Based p‐i‐n Solar Cells

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Cited by 35 publications
(20 citation statements)
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“…The observation that V oc,bot ≤ 580 mV, while mean V oc ≥ 900 mV for all passivated cells, indicates that the V oc of the top cell, V oc,top ≥ 320 mV, and may be as high as 400 mV. This is in agreement with a previous measurement of V oc = 370 mV made on a Si NC/SiC membrane cell [38] and shows that the top cell delivers a substantial portion of the tandem cell V oc . Passivation increases mean V oc of 3 nm tandem cells by 48 mV and thus plays an integral role in achieving high V oc in a Si NC cell.…”
Section: Open-circuit Voltagesupporting
confidence: 91%
See 1 more Smart Citation
“…The observation that V oc,bot ≤ 580 mV, while mean V oc ≥ 900 mV for all passivated cells, indicates that the V oc of the top cell, V oc,top ≥ 320 mV, and may be as high as 400 mV. This is in agreement with a previous measurement of V oc = 370 mV made on a Si NC/SiC membrane cell [38] and shows that the top cell delivers a substantial portion of the tandem cell V oc . Passivation increases mean V oc of 3 nm tandem cells by 48 mV and thus plays an integral role in achieving high V oc in a Si NC cell.…”
Section: Open-circuit Voltagesupporting
confidence: 91%
“…The p+ Si/n+ SiC TRJs developed for these cells are sufficiently conductive to not restrict cell performance and were successfully integrated into the tandem cells. The resulting devices functioned as tandem cells, with mean V oc values of 900–950 mV exceeding those attainable from a single c‐Si or Si NC/SiC cell . Lifetime measurements showed that the bottom cell contributes less than 580 mV to V oc , indicating that the Si NC/SiC cell contributes more than 320 mV.…”
Section: Resultsmentioning
confidence: 98%
“…Reduction of the layer thickness is expected to decrease the total resistivity of the layer, especially in the deeper low porosity part of the device which cannot behave as a widegap material. The devices performance presented here fall in the same range of value compare to other reported Si based nanodot devices produced through alternative method [29][30][31][32][33], except for the higher photovoltage reported in this study. All devices based on Si nanostructures appeared to suffer from the same high density of states present in the material.…”
Section: Photovoltaic Characterizationsupporting
confidence: 74%
“…This is a unique advantage for p-i-n heterostructures compared with p-n heterostructures. There are many previous reports to confirm the effectiveness of p-i-n architecture, such as ZnO-PbSe-CuI p-i-n solar cell30, Si QDs p-i-n solar cell31, Si nanowires-based p-i-n photodetector32, GaAs nanowire array solar cell with axial p-i-n junction33 and P3HT-blend-PCBM p-i-n thin film photoconductors34. Here in this paper, we use n-type ZnO micro/nanowire arrays as electron transport layer, FeS 2 nanocrystals (NCs) film as intrinsic light absorber layer and p-type CuI film as hole transport layer to form p-i-n heterostructure, and improving responsivity of FeS 2 photodiode are confirmed.…”
mentioning
confidence: 99%