1999
DOI: 10.1016/s0039-6028(99)00344-1
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A medium energy ion scattering study of the structure of Sb overlayers on Cu(111)

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Cited by 155 publications
(67 citation statements)
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“…For all the curves, the counts originating from the outermost layer have been subtracted, as this cannot produce blocking dips. The angular positions of the dips in the substrate scattering signal have been used to correct the angular scale of the data to within 0.5°, which is a standard procedure for this instrument [16]. The strong dip in this data range corresponds to the [111] blocking direction that is expected to be at 54.8° scattering angle (70.5° exit angle).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…For all the curves, the counts originating from the outermost layer have been subtracted, as this cannot produce blocking dips. The angular positions of the dips in the substrate scattering signal have been used to correct the angular scale of the data to within 0.5°, which is a standard procedure for this instrument [16]. The strong dip in this data range corresponds to the [111] blocking direction that is expected to be at 54.8° scattering angle (70.5° exit angle).…”
Section: Resultsmentioning
confidence: 99%
“…The MEIS measurements were made using CLRC central facilities [16] based at Daresbury Laboratory, UK. A Cu(111) crystal was prepared ex situ using the usual methods.…”
Section: Methodsmentioning
confidence: 99%
“…All the experiments were performed at the UK National MEIS facility [25]. This apparatus comprises three principal sections connected by UHV transfer mechanisms and fast entry load lock.…”
Section: Methodsmentioning
confidence: 99%
“…19 The facility comprises an ion source and beamline, capable of delivering a welldefined beam of ions to an experimental endstation housing an analysis chamber, together with additional chambers for sample preparation, storage, and fast entry into the UHV system. The collimated beam of ions enters the analysis chamber, and after passing through a beam current monitor, is incident on the sample mounted on a six-axis goniometer that allows precise alignment of the sample with the beam.…”
Section: Methodsmentioning
confidence: 99%