2015
DOI: 10.1088/0022-3727/48/45/455501
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A mechanism of the penetration limit for producing holes in poly(4-vinyl phenol) films by inkjet etching

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Cited by 2 publications
(7 citation statements)
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“…The mechanism of this inkjet‐etching process for via‐hole formation is commonly known as the coffee‐ring effect due to the microfluid flows in a sessile droplet. [ 38–43 ] Such an inkjet‐based selective etching process has several advantages over conventional complex photolithographic etching processes and can therefore allow a simple maskless, photoresist‐free, and cost‐saving patterning process feasible for creating open via‐holes in electronic devices, biochips, and micropatterned cell arrays. [ 38–43 ] In particular, based on these advantages, inkjet‐etched open via‐holes were also used as bank‐like walls not only for thin‐film transistors [ 38,41 ] but also for inkjet‐printed micro‐OLEDs (μ‐OLEDs), [ 42,43 ] which were produced by the subsequent inkjet printing of light‐emitting materials into the inkjet‐etched open via‐holes.…”
Section: Introductionmentioning
confidence: 99%
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“…The mechanism of this inkjet‐etching process for via‐hole formation is commonly known as the coffee‐ring effect due to the microfluid flows in a sessile droplet. [ 38–43 ] Such an inkjet‐based selective etching process has several advantages over conventional complex photolithographic etching processes and can therefore allow a simple maskless, photoresist‐free, and cost‐saving patterning process feasible for creating open via‐holes in electronic devices, biochips, and micropatterned cell arrays. [ 38–43 ] In particular, based on these advantages, inkjet‐etched open via‐holes were also used as bank‐like walls not only for thin‐film transistors [ 38,41 ] but also for inkjet‐printed micro‐OLEDs (μ‐OLEDs), [ 42,43 ] which were produced by the subsequent inkjet printing of light‐emitting materials into the inkjet‐etched open via‐holes.…”
Section: Introductionmentioning
confidence: 99%
“…[ 38–43 ] Such an inkjet‐based selective etching process has several advantages over conventional complex photolithographic etching processes and can therefore allow a simple maskless, photoresist‐free, and cost‐saving patterning process feasible for creating open via‐holes in electronic devices, biochips, and micropatterned cell arrays. [ 38–43 ] In particular, based on these advantages, inkjet‐etched open via‐holes were also used as bank‐like walls not only for thin‐film transistors [ 38,41 ] but also for inkjet‐printed micro‐OLEDs (μ‐OLEDs), [ 42,43 ] which were produced by the subsequent inkjet printing of light‐emitting materials into the inkjet‐etched open via‐holes. During these subsequent inkjet‐printing processes, however, several critical pixel defects can arise due to misalignments between the inkjet‐etched open via‐holes and the subsequent inkjet‐printed material arrays.…”
Section: Introductionmentioning
confidence: 99%
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