A Low-Power Surfatron Source for the Atomic-Emission-Spectrometric Detection of Nonmetals in Aqueous Solution

Galante, Leonard J.; Selby, Mark; Hieftje, Gary M.

doi:10.1366/0003702884429265

Cited by 46 publications

(9 citation statements)

References 26 publications

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“…The SWD has found many applications, some of which are well documented: materials processing ( Hubert et al 1986, Deruaz and Mermet 1986, Selby and Hieftje 1987, Selby et al 1987, Rivikre et ai 1987, Galante et al 1988, Besner eta1 1988 and lighting (Beauchemin et al1986, Beneking and Anderer 1987, Levy 1990, Margot et a/ 1991.…”

Section: Introductionmentioning

confidence: 99%

Plasma sources based on the propagation of electromagnetic surface waves

Moisan

Zakrzewski

1991

J. Phys. D: Appl. Phys.

437

265

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Microwave and RF plasmas are finding increasing use in materials processing, plasma chemistry, chemical analysis, and other fields. This is stimulating the search for suitable plasma sources. In the 1970s, electromagnetic surface waves were put to use to sustain plasmas and an efficient microwave device, called a surfatron. was developed for this purpose. Recent work has shown that such discharges can also operate at radio frequencies. A large number of on surface-wave plasmas experimental data have been accumulated-their modelling is well advanced and they have found applications in various fields of research and technology. This paper reviews the physical principles of operation and the design of surface-wave plasma sources. Since the wave launcher is the central component of the source, this review presents a unified description of several compact, efficient. and easy to operate launchers specifically intended for plasma generation that have been developed over the past fifteen years. It is now possible to sustain such plasmas at frequencies ranging from 1 MHz to 10 GHz, in a pressure domain extending from 10-5Torr up to few times atmospheric pressure, and in a rich variety of plasma vessels and reaction chambers.

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Section: Introductionmentioning

confidence: 99%

Plasma sources based on the propagation of electromagnetic surface waves

Moisan

Zakrzewski

1991

J. Phys. D: Appl. Phys.

437

265

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“…Analytical applications of the surface wave plasmas Surface wave plasmas are now used in several analytical laboratories. Although some work has been done on direct liquid sample analysis [14,22] with the surface wave plasma, most of the analytical efforts have been devoted to gas phase sample analysis. The samples that have been analyzed are atomic (Hg cold vapor) [23] and molecular gases (Cl 2 , I 2 , Br 2 ) [15,24,25] produced by various chemical reactions.…”

Section: Surface Wave Plasmasmentioning

confidence: 99%

Atomic spectroscopy with surface wave plasmas

Hubert

Bordeleau

Tran

et al. 1996

Analytical and Bioanalytical Chemistry

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The use of microwave induced plasmas, particularly of surface wave plasmas, as detectors in atomic emission spectrometry for elemental analysis is reviewed. Surface wave plasmas have been produced at low HF power and used as gas chromatographic detectors. The analytical performances for the detection of non-metals with a Fourier transform spectrometer and a two-channel filter unit are reported. The excitation behavior of non-metals in helium-based mixed gas-plasmas has also be studied. In particular, the effect of power and of nitrogen concentration on the bromine emission has been systematically investigated. A nine-fold improvement of the detection limits for bromine can be obtained in a high power (900 W) helium-nitrogen (0.1-0.2%) plasma.

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“…Moreover, existing HeMIPs, including the Beenakker cavity, the surfatron, and the microwave plasma torch-based systems, have low tolerance to excessive amounts of solvent from the wet aerosol produced by solution nebulization. [6][7][8] This study focuses on the first application of a annularshaped low-flow low-power helium microwave induced plasma. The new MIP system, based on the TEM resonator, has been designed and investigated.…”

Section: Introductionmentioning

confidence: 99%