2008
DOI: 10.1021/la8021694
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A Lithography-Free Pathway for Chemical Microstructuring of Macromolecules from Aqueous Solution Based on Wrinkling

Abstract: We report on a novel lithography-free method for obtaining chemical submicron patterns of macromolecules on flat substrates. The approach is an advancement of the well-known microcontact printing scheme: While for classical microcontact printing lithographically produced masters are needed, we show that controlled wrinkling can serve as an alternative pathway to producing such masters. These can even show submicron periodicities. We expect upscaling to larger areas to be considerably simpler than that for exis… Show more

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Cited by 98 publications
(101 citation statements)
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“…[ 86 , 87 ] An even simpler method for forming wrinkles involves surface oxidation of PDMS to establish the required stiffness mismatch. [ 88 ] With an adequate plasma exposure dose, a hard fi lm of SiO 2 with E f = 70 GPa, v f = 0.17 and thickness d dependent on the plasma power and time can be formed on the surface of PDMS. This compares to soft bulk PDMS having E f = 7.1 MPa and v f = 0.5.…”
Section: Reviewmentioning
confidence: 99%
“…[ 86 , 87 ] An even simpler method for forming wrinkles involves surface oxidation of PDMS to establish the required stiffness mismatch. [ 88 ] With an adequate plasma exposure dose, a hard fi lm of SiO 2 with E f = 70 GPa, v f = 0.17 and thickness d dependent on the plasma power and time can be formed on the surface of PDMS. This compares to soft bulk PDMS having E f = 7.1 MPa and v f = 0.5.…”
Section: Reviewmentioning
confidence: 99%
“…Wrinkles were aligned perpendicular to the applied strain (Bowden et al, 1999). Both the wavelength and the amplitude could be controlled via the plasma dose applied (Pretzl et al, 2008). In D. Voigt and others detail, the PDMS elastomer was prepared by mixing Sylgard 184 (Dow Corning, Midland, MI, USA) with a 10:1 ratio by mass of pre-polymer to curing agent.…”
Section: Substratesmentioning
confidence: 99%
“…film drying), in both uni-and multi-axial geometries. Whilst several film fabrication methods yield laminate structures [25][26][27][28][29][30][31] , surface modification of the substrate material is an attractive route to skin formation due to its simplicity, good adhesion inter-layer adhesion properties promoting resilience to delamination upon strain 25,[32][33][34][35] . Elastomeric polydimethylsiloxane (PDMS) has been the substrate of choice for soft lithography 36 , in part due to its optical transparency, nm-replication fidelity, surface adhesion and bulk mechanical properties, and ease of handling.…”
Section: Introductionmentioning
confidence: 99%