A large volume quiescent plasma in a uniform magnetic field

Ault, E. R.; MacKenzie, K. R.

doi:10.1063/1.1686035

Cited by 12 publications

(5 citation statements)

References 3 publications

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“…Another method is the use of an array of permanent magnets in the form of a magnetic bucket (84,85). This kind of magnetic geometry has been long used for the confinement of laboratory plasmas of various kinds (86)(87)(88), and it also works well for cathodic arc plasmas. The deposition profile (radial distribution of deposited film thickness) follows the plasma density profile (radial distribution of plasma density in the region immediately adjacent to the substrate).…”

Section: Thickness Uniformitymentioning

confidence: 99%

Cathodic Arc Deposition of Films

Brown

1998

Annu. Rev. Mater. Sci.

188

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Cathodic arc deposition is a plasma-based technology for the fabrication of films. The process can be carried out either at high vacuum or in a low pressure gaseous environment, and films can be formed for example of metals, ceramics, diamondlike carbon, some semiconductors and superconductors, and more. The plasma stream can be filtered to remove microdroplet contamination, and the ion energy can be controlled by substrate bias, thereby transforming the straightforward deposition method into hybrids with other surface modification processes such as ion beam-assisted deposition, ion beam mixing, and ion implantation. The method provides a versatile and powerful plasma tool for the synthesis of novel and technically important surfaces.

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Section: Thickness Uniformitymentioning

confidence: 99%

Cathodic Arc Deposition of Films

Brown

1998

Annu. Rev. Mater. Sci.

188

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“…The last crucial confinement property of MMF based plasma sources is radial uniformity of plasma density across the magnetic field. Earlier research in cusp magnetic field geometry the radial uniformity can be changed with changing permanent magnets [9,20]. These devices do not have control over the area of null region of cusp magnetic field and hence on the mean plasma density, radial uniformity of plasma density unless the number of poles are changed.…”

Section: Introductionmentioning

confidence: 99%

Characterization of argon plasma in a variable multi-pole line cusp magnetic field configuration

Patel¹,

Sharma²,

Ramasubramanian³

et al. 2020

Phys. Scr.

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This paper demonstrates a detailed characterization of argon plasma in a variable multi-pole line cusp magnetic field (VMMF). The VMMF has been produced by placing six electromagnets (with embedded profiled vacoflux-50 core) over a large cylindrical volume (1 m axial length and 40 cm diameter). The magnetic field have been measured by hall probe method and compared with simulated magnetic field by performing simulation using FEMM tools. Results from magnetic field simulation indicate that the rate of change of pole magnetic field (maximum magnetic field) with respect to magnet current for vacoflux-50 core is high (7.53 G/A) as compared to the simple air core electromagnet (2.15 G/A). The area of the nearly field free region (null region) in the chamber volume can be controlled without changing a number of pole magnets. From the experimental results, it has been observed that in this field configuration the confinement of the primary electrons increases and leak width of plasma decreases with increasing the magnetic field. Thus the mean density, particle confinement time and the stability of the plasma increase with increasing magnetic field. In addition to this, it has been found that the radial uniformity of the plasma density explicitly depends on the VMMF. It is also shown that the VMMF controls the scavenging of confined primary electrons and confinement of primary electron increased with magnetic field which helps to boost up the plasma density.

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“…These confinement schemes have a 'minimum-B'-like magnetic structure, i.e. the magnetic field strength increases with radius (d|B|/dr > 0), or equivalently, the field curvature is convex toward the plasma: a configuration that is magnetohydrodynamically stable to macroscopic plasma instabilities [12,13].…”

Section: Introductionmentioning

confidence: 99%

“…Multi-cusp magnetic walls can be obtained using permanent magnets or current-carrying conductors. Following the work of MacKenzie and co-workers [12,13], permanent samarium-cobalt or neodymium-iron magnets are often used to establish a very high-order multipole field. Highorder magnetic multipole confinement systems have the characteristic that the magnetic field in the plasma region distant from the magnetic walls is very low.…”

Section: Introductionmentioning

confidence: 99%

Magnetic system for producing uniform coatings using a filtered cathodic arc

Bilek¹,

Anders²,

Brown

2001

Plasma Sources Sci. Technol.

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Curved magnetic filters are commonly used with cathodic arcs to remove macroparticles from the plasma stream, making them suitable for the preparation of smooth, dense and defect-free films. Such a filter produces a well focused plasma beam of Gaussian-like profile. This presents a problem in applications where uniform films over an area of more than a few square centimetres are required. We show that it is possible to expand and flatten the plasma profile over a distance of only 20 cm beyond the exit of the filter using a plasma homogenizer and a set of strategically placed current carrying wires. The best results were achieved using an 'expander' coil, carrying current in a sense opposite to that in the filter solenoid, to create a region of weaker field where the field lines expand rapidly just outside the filter. Another coil, a 'collimator', carrying current in the same sense as the filter, was placed downstream of the expanding coil, to straighten the paths of the expanded field lines. The thus expanded plasma beam was then passed through a multipole magnetic homogenizer to achieve thickness deviations of less than 10% over a 10 cm diameter area.

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A large volume quiescent plasma in a uniform magnetic field

Cited by 12 publications

References 3 publications

Cathodic Arc Deposition of Films

Cathodic Arc Deposition of Films

Characterization of argon plasma in a variable multi-pole line cusp magnetic field configuration

Magnetic system for producing uniform coatings using a filtered cathodic arc

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