A large deflection and high payload flexure-based parallel manipulator for UV nanoimprint lithography: Part I. Modeling and analyses

Structural optimization for flexure-based parallel mechanisms – Towards achieving optimal dynamic and stiffness properties

“…Due to their unique actuation, compliant mechanisms can eliminate backlash and dry friction [1,2]. These in turn allow the compliant mechanisms to achieve highly repeatable motions, making them the ideal candidates for many micro/nano-positioning applications [3,4].…”

“…Subsequently, the desired compliant mechanism is synthesized by using suitable flexures to replace the joints of the selected mechanism [8,4,9]. The constraintbased design method, however, realizes the desired kinematics by using flexures to create a suitable constraint topology on the rigid components [10,11].…”

An inverse Prandtl–Ishlinskii model based decoupling control methodology for a 3-DOF flexure-based mechanism

“…However, the hysteresis of the piezoelectric ceramic significantly reduces the positioning accuracy of the developed system, so a variety of hysteresis models and control methodologies for the piezoelectric have been proposed. In addition, electromagnetic-driven flexure stage starts to be designed in recent years [12][13][14], especially in the requirement of large stroke, but electromagnetic drive such as voice coil motor usually owns small output force, leading to a small stiffness of the stage and further a low resonant frequency. In reference [15,16], it is easy to find the mainstream modeling and control methods of piezo-actuated nanopositioning stages, and in reference [17], a corresponding general skeleton on this is presented.…”

A large-range compliant micropositioning stage with remote-center-of-motion characteristic for parallel alignment

“…Micro-/nanopositioning systems capable of precise parallel alignment have been widely used in many fields such as micromachining, nanoimprint lithography, optics element alignment, fiber assembly, etc (Zhang et al 2006;Teo et al 2014;Lin and Chen 2008). For parallel alignment, an orientation stage that can realize out-of-plane adjustment is often needed to make proper alignment between two flat surfaces.…”