A Kinetic Study of Chemical Vapor Deposition of AlN/TiN Composite Film.

Oriented External Electric Field Modulated Superhalogen Characteristic and Photoelectric Properties of Al4N2 Cluster: A Density Functional Theory Study

“…Especially, the Al m N n cluster compounds play an important role in the preparation of AlN nanofilms by magnetron reactive sputtering (MRS) and microelectronics. [44,45] In this study, based on the density functional theory (DFT), the effects of OEEF on the geometrical structures, electronic properties, photoelectron spectrum (PES), and NLO responses of the Al 4 N 2 cluster were investigated. It was observed that the OEEF along the x direction can continuously increase the EA value of the Al 4 N 2 cluster, transforming it to a member of superhalogens while maintaining its geometrical stability.…”

“…In recent years, AlN clusters have increasingly drawn the attention of researchers, primarily due to the systematic and in‐depth study of condensed matter theory and AlN thin film materials. Especially, the Al m N n cluster compounds play an important role in the preparation of AlN nanofilms by magnetron reactive sputtering (MRS) and microelectronics [44,45] …”

Chemical Vapor Deposition of Silicon Carbide/Titanium Carbide Composite Films from Dichlorodimethylsilane, Titanium Tetrachloride, and Methane

“…Liu et al reported that the nanocomposite films of AlN/TiN could deposit from the AlCl 3 /TiCl 4 / NH 3 chemical system. 13 Their kinetic analysis showed that the AlN and TiN growth species formed in the gas phase, independent of each other, from the reactions between AlCl 3 and NH 3 and between TiCl 4 and NH 3 , respectively. AlCl 3 and TiCl 4 did not influence each other in the gas phase.…”