In
this paper, we explore the effect of H and its bonding configurations
on the defect state density and orbital localization of hydrogenated
amorphous Si (a-Si:H)/crystalline Si (c-Si) heterostructures using
density functional theory (DFT) studies of model interfaces between
amorphous silicon (a-Si)/a-Si:H and c-Si. To model the atomic configuration
of a-Si on c-Si, melting and quenching simulations were performed
using classical molecular dynamics. Different hydrogen contents were
inserted into a-Si in different bonding configurations followed by
DFT relaxation to create stable structures of a-Si:H representative
of hydrogenated a-Si on crystalline Si surfaces. In contrast to typical
Si heterojunctions (e.g., Si/SiO2, where the defect density
is maximum at the interface), we find that the defect state density
is low at the interface and maximum in the bulk of a-Si. Structural
analysis shows that in these configurations, H atoms do not necessarily
bond to dangling bonds or to interface atoms. However, they are able
to significantly change the atomic structure of the heterostructure
and consequently decrease the density of defect states and orbital
localization in the a-Si layer, particularly at the interface of a-Si/c-Si.
The general form of the simulated defect state distribution demonstrates
the passivating role of a-Si:H on c-Si substrates.