2023
DOI: 10.1016/j.apsusc.2022.155366
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A key factor in determining the effectiveness of etchants for electrochemical surface enlargement of Ta foil for electrolytic capacitor

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Cited by 5 publications
(6 citation statements)
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“…Our previous studies have shown that the pit walls are easily protected by adsorbed oxygen in the solution containing Br, while the bottom of the pit is continuously etched due to the high concentration of Br ions. 11 In addition, in this study we do not study the mechanism of pitting, but only the morphological evolution of pitting after its formation. Based on this, we developed two microscopic models of the etch pits as shown in Figs.…”
Section: ) Boundary Conditionsmentioning
confidence: 98%
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“…Our previous studies have shown that the pit walls are easily protected by adsorbed oxygen in the solution containing Br, while the bottom of the pit is continuously etched due to the high concentration of Br ions. 11 In addition, in this study we do not study the mechanism of pitting, but only the morphological evolution of pitting after its formation. Based on this, we developed two microscopic models of the etch pits as shown in Figs.…”
Section: ) Boundary Conditionsmentioning
confidence: 98%
“…If ultra-thin etched tantalum foil with a high specific surface area (SSA) is used as the anode, none of the above will be a problem. In order to effectively increase the SSA of tantalum foil, our group has carried out a series of works to investigate the passivation mechanism, 10 electrochemical corrosion mechanism 11,12 and anisotropy of electrochemical corrosion of tantalum. 13 We found that oxygen (including dissolved oxygen in liquids) is the main species that causes spontaneous passivation of tantalum.…”
Section: Supplementary Materials For This Article Is Available Onlinementioning
confidence: 99%
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“…We have proven in another work that the re-passivation of Ta in a corrosive agent is a key factor in obtaining high SSA. [13] In addition, the pit walls are always more likely to be re-passivated in a solution containing Br than the pit bottom. Electrochemical machining processes with DC pulses as the power source undergo anodic dissolution only at PWH (high level), but not at the PWL (low level) stage.…”
Section: Sufficient Time To Complete Re-passivationmentioning
confidence: 99%
“…Our research group has been committed to solving this problem and has done a lot of research. In the previous work, the effect of etching agent type [12,13] and crystal surface orientation [14] on tantalum foil SSA has been discussed theoretically. These works have laid a good theoretical foundation for this topic.…”
Section: Introductionmentioning
confidence: 99%