2018
DOI: 10.1016/j.ceramint.2018.07.124
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A hydrothermal etching route to synthesis of 2D MXene (Ti3C2, Nb2C): Enhanced exfoliation and improved adsorption performance

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Cited by 340 publications
(163 citation statements)
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“…The (002) reflection shifts from 9.55 (MAX phase) to 9.00 and 9.10 2θ deg, for the samples Ti 3 C 2 T x _HF high and Ti 3 C 2 T x _HF low , respectively, determining a corresponding expansion of planes along the c parameters (Table S1, Supporting Information). [16,20] This expansion, therefore, changes with the acid concentration and the treatment times and it is related to a different ratio of O/OH/F terminations [38] and to the presence of small molecules in the layers (H 2 O, H 2 ). This latter circumstance is verified for the Ti 3 C 2 T x _HF high sample, as demonstrated by TGA-MS analysis (see next section), wherein water molecules are trapped between layers during the fast etching reaction.…”
Section: Resultsmentioning
confidence: 99%
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“…The (002) reflection shifts from 9.55 (MAX phase) to 9.00 and 9.10 2θ deg, for the samples Ti 3 C 2 T x _HF high and Ti 3 C 2 T x _HF low , respectively, determining a corresponding expansion of planes along the c parameters (Table S1, Supporting Information). [16,20] This expansion, therefore, changes with the acid concentration and the treatment times and it is related to a different ratio of O/OH/F terminations [38] and to the presence of small molecules in the layers (H 2 O, H 2 ). This latter circumstance is verified for the Ti 3 C 2 T x _HF high sample, as demonstrated by TGA-MS analysis (see next section), wherein water molecules are trapped between layers during the fast etching reaction.…”
Section: Resultsmentioning
confidence: 99%
“…[16,17] After the etching and washing process, the titanium is functionalized with different groups (-O, -OH, -F, or -Cl) depending on the acid kind and concentration. [18][19][20] The T terminating groups have an effect on the materials structural and functional properties, density functional theory (DFT) calculations have shown that the functionalization influences the spacing of the M n+1 X n T x layers. [4] As widely demonstrated in literature, the etching can be carried out in hydrofluoric acid; the higher the acid concentration the faster the reaction rate and it is possible to obtain MXene from MAX phase in 2 h with hydrofluoric (HF) 50 wt%.…”
Section: Introductionmentioning
confidence: 99%
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“…Examples include MXenes, Ti 3 C 2 and Nb 2 AlC, reported to have higher interlayer distance and large specific surface area, which could affect its accommodation of more cations in between layers. Thus, increasing the storage capacity for supercapacitor application . Furthermore, hydrothermal surface functionalisation of MXene also contributes to improving yield of 2D MXene sheets.…”
Section: Synthetic Methodsologies Of 2d Materialsmentioning
confidence: 99%
“…Apart from HF, other etchants were used to selectively etch the A layers and produce MXenes. Most of them comprised an acid and a source of fluoride ions, such as NH4HF2 (used in paper I), LiF + HCl (used in paper II), NaBF4 + HCl [85], molten baths of KF, LiF and NaF in the case of Ti4AlN3 to produce Ti4N3Tz [27]. Whereas, for selectively removing Si layers from Ti3SiC2 and producing Ti3C2Tz, a mixture of HF and an oxidant such as H2O2, (NH4)2S2O8, HNO3, KMnO4, FeCl3 was used [30].…”
Section: Factors Influencing the Production Of Mxenesmentioning
confidence: 99%