A Housing-Quality Measuring Scale

Edwards, C. M.

doi:10.13031/2013.39505

Cited by 2 publications

(2 citation statements)

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“…This would be consistent with the observed increase in the deposition of Cu with an increase in ascorbic acid concentration. However, there is another potential role the addition of ascorbic acid to the solution may play . The addition of ascorbic acid may alter the pH of the solution, which could impact the protonation state of tartrate (causing it to be a less effective chelator) or promote the formation of HF, which will increase the etch rate, allowing faster deposition.…”

Section: Results and Discussionmentioning

confidence: 99%

Fabrication and Growth Control of Metal Nanostructures through Exploration of Atomic Force Microscopy-Based Patterning and Electroless Deposition Conditions

et al. 2020

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Applications such as biosensing, plasmonics, and nanoelectronics require nanoscale metal structures with controlled dimensions and placement. However, significant challenges remain in the fabrication of metal nanostructures of controlled size, shape, and placement on a solid support. Among these challenges are precise positional control at the nanoscale, flexibility and tunability in shape, and the cost and complexity of methods. This work presents the development and exploration of methods for the fabrication of copper, silver, and gold (Cu, Ag, and Au) nanostructures directly on silicon (Si) substrates through the use of atomic force microscopy (AFM)-based nanofabrication using a self-assembled monolayer (SAM) resist followed by metal deposition in the structure using electroless deposition (ELD). The importance of the role of the SAM resist layer is highlighted, as it is critical to prevent metal deposition on the areas of the substrate outside the desired pattern. We have found that octadecyltrichlorosilane (OTS) monolayers are much more robust and resistant films for the ELD process than either octadecyl SAMs, formed from alkenes on hydrogen-terminated Si, or octadecyldimethylchlorosilane (ODMS) SAM films. In addition, the patterning parameters used for the AFM-based fabrication, the ELD solution parameters, and the role of doping of Si have been explored and together the results suggest that with proper tuning of the ELD solution concentrations and the use of a robust SAM resist film, such as OTS, tunable metal nanostructures are achievable. This is demonstrated here for Cu, Ag, and Au, but the process should be adaptable to a variety of metals, as long as the redox potentials are compatible with the oxidation of Si. Importantly, this method exploits the exquisite tunability of AFM-based lithography to provide precise control over the size, shape, and position of the metal nanostructure. This provides significant advantages for prototyping of new structures, as well as fundamental investigations of the properties of such nanostructures.

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Section: Results and Discussionmentioning

confidence: 99%

Fabrication and Growth Control of Metal Nanostructures through Exploration of Atomic Force Microscopy-Based Patterning and Electroless Deposition Conditions

et al. 2020

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“…The spacing of array elements was varied using nanospheres with different diameters during NSL. The plating process takes only minutes to form nanodot arrays once the nanopore arrays are made using NSL, and the OTS monolayer shows improved resistance to ELD over other silanes, , enabling a simple, highly tunable, low-cost, high-throughput approach that allows control of metal nanodot spacing and size over large areas of the substrate.…”

Section: Introductionmentioning

confidence: 99%

Periodic Silver and Gold Nanodot Array Fabrication on Nanosphere Lithography-Based Patterns Using Electroless Deposition

et al. 2020

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Precision-controlled fabrication of metallic nanostructures is of great interest in applications such as sensing, optoelectronics, and high-capacity storage devices. However, the expense and throughput of the current methods limit the applicability of metal nanodot arrays for many of these applications. This issue is addressed by a method for generating periodic silver (Ag) and gold (Au) nanodot arrays in a straightforward, inexpensive, tunable way. Specifically, regularly placed hexagonal arrays of Ag and Au nanodots were fabricated on Si(111) surfaces via a nanosphere lithography-based approach followed by electroless deposition (ELD). Silicon surfaces with hexagonally packed nanospheres were reacted with octadecyltrichlorosilane (OTS) to form a self-assembled monolayer resist over the substrate, which leads to a hexagonal array of nanopores upon removal of the spheres. Different electroless plating solutions for Ag and Au were introduced onto the nanopore surfaces to selectively deposit metal in the nanopores, resulting in metal nanodots grown only in the nanopores, where the nanospheres were originally in contact with the substrate. Ag and Au nanodot heights can be effectively tuned from 20 to 100 nm by varying the plating time and the composition of the plating solution. Atomic force microscopy (AFM) was used to characterize the height and diameter of the nanopore and nanodot arrays along with energydispersive X-ray spectroscopy (EDS) to characterize the elemental composition distribution on the surface. This method provides control over the distance between nanodots and their size at the nanoscale with high reproducibility.

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A Housing-Quality Measuring Scale

Cited by 2 publications

References 0 publications

Fabrication and Growth Control of Metal Nanostructures through Exploration of Atomic Force Microscopy-Based Patterning and Electroless Deposition Conditions

Fabrication and Growth Control of Metal Nanostructures through Exploration of Atomic Force Microscopy-Based Patterning and Electroless Deposition Conditions

Periodic Silver and Gold Nanodot Array Fabrication on Nanosphere Lithography-Based Patterns Using Electroless Deposition

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