2019
DOI: 10.1063/1.5109321
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A high-pressure x-ray photoelectron spectroscopy instrument for studies of industrially relevant catalytic reactions at pressures of several bars

Abstract: We present a new high-pressure x-ray photoelectron spectroscopy system dedicated to probing catalytic reactions under realistic conditions at pressures of multiple bars. The instrument builds around the novel concept of a "virtual cell" in which a gas flow onto the sample surface creates a localized high-pressure pillow. This allows the instrument to be operated with a low pressure of a few millibar in the main chamber, while simultaneously a local pressure exceeding 1 bar can be supplied at the sample surface… Show more

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Cited by 79 publications
(121 citation statements)
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“…In particular, we can find a small spectral shoulder at 307.9 eV, as displayed in the overlapping comparison plot of CO(g) and CO 2 (g) in Supplementary Fig. 7 , which implies that the surface Rh 3 d core-level shifts get involved in the adsorbate‒Rh atoms bonding formation properties by reactive molecule collisions and electronic charge redistribution on the Rh(111) surface 44 46 .
Fig.
…”
Section: Resultsmentioning
confidence: 76%
“…In particular, we can find a small spectral shoulder at 307.9 eV, as displayed in the overlapping comparison plot of CO(g) and CO 2 (g) in Supplementary Fig. 7 , which implies that the surface Rh 3 d core-level shifts get involved in the adsorbate‒Rh atoms bonding formation properties by reactive molecule collisions and electronic charge redistribution on the Rh(111) surface 44 46 .
Fig.
…”
Section: Resultsmentioning
confidence: 76%
“…S3). The precise measurement by using ARPES can open new opportunities to monitor the work function on the surface, for example, in ambient conditions [52][53][54][55] , under controlled application of strain 56,57 , during phase transitions or crossovers [58][59][60] and upon irradiation of intense femtosecond pulses 30,[61][62][63][64] .…”
Section: Discussionmentioning
confidence: 99%
“…24 Reasonable distances for lab-based systems are typically in the range of 500–800 µm, 14,25–27 while for synchrotron applications this distance can be reduced to 150–300 µm 28 and for some specific cases, including the system used herein, down to 30 µm. 13,29 At these distances, a small change in distance of 1 µm can have a substantial effect on the pressure over the sample, the pressure in the differentially pumped section, and the signal from the sample. To date, few systems have been able to achieve pressures over 50 mbar.…”
Section: Introductionmentioning
confidence: 99%
“…For all differentially pumped systems, the sample-to-aperture distance is monotonically related to the pressure in the differential pumping stage. 13,30 Therefore, maintaining a constant pressure in the first differential pumping stage also maintains a constant sample-to-aperture distance. A pressure gauge in this stage is an ideal source of information for developing a position feedback loop, to maintain a constant separation due to the pressure depending on the sample-to-aperture distance yet being measured independently.…”
Section: Introductionmentioning
confidence: 99%
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