2019
DOI: 10.1088/2053-1583/ab23ba
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A high-performance MoS 2 synaptic device with floating gate engineering for neuromorphic computing

Abstract: As one of the most important members of the two dimensional chalcogenide family, molybdenum disulphide (MoS2) has played a fundamental role in the advancement of low dimensional electronic, optoelectronic and piezoelectric designs. Here, we demonstrate a new approach to solid state synaptic transistors using two dimensional MoS2 floating gate memories. By using an extended floating gate architecture which allows the device to be operated at near-ideal subthreshold swing of 77 mV/decade over four decades of dra… Show more

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Cited by 92 publications
(131 citation statements)
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“…The background colors show their stabilities in ambient and vacuum. The 2D insulators supply an ultra‐flat dielectric layer in the electrochemical metallization/conductive bridge‐based resistance switching devices, as well as the barrier of tunneling effect‐based synaptic devices …”
Section: Library Of 2d Materials and Their Heterostructuresmentioning
confidence: 99%
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“…The background colors show their stabilities in ambient and vacuum. The 2D insulators supply an ultra‐flat dielectric layer in the electrochemical metallization/conductive bridge‐based resistance switching devices, as well as the barrier of tunneling effect‐based synaptic devices …”
Section: Library Of 2d Materials and Their Heterostructuresmentioning
confidence: 99%
“…Paul et al successfully improved the efficiency of gating, leading to a quasi‐ideal subthreshold swing (77 mV per decade) and reduction of the required drain bias and switching pulse, by using an extend graphene floating gate, as shown in Figure a,b . An h‐BN layer, working as tunneling barrier, separates the floating gate and channel, which could control the charge transfer and tune the conductance of the channel between them for mimicking the synaptic plasticity (Figure c–e).…”
Section: D Materials and Heterostructure‐based Synaptic Devicesmentioning
confidence: 99%
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“…The area of application of monolayer materials for construction of electronic nanodevices is currently under strong development [1,[7][8][9][10][11][12]. Methods for building devices based on gated TMDC monolayers or nanotubes become increasingly advanced [13][14][15][16][17], opening the possibility of utilizing the spin and valley index of electrons controlled therein.…”
Section: Introductionmentioning
confidence: 99%