A Grazing Incidence Microscope for X‐ray Imaging Applications

Silk, J. K.

doi:10.1111/j.1749-6632.1980.tb47213.x

Cited by 14 publications

(9 citation statements)

References 3 publications

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“…The merit of an imaging system (e.g., a microscope or telescope) is based on two primary requirements: (1) stigmatism, i.e., pointlike, imaging between a particular object-image pair; and (2) uniform magnification independent of where a ray strikes the optical aperture. The famous sine rule of Abbe1 7 states that a nearly uniform magnification is obtained if the ratio in sines of the incident and reflected angles, made with the axis joining object and image, is constant across the mirror aperture. This is equivalently stated as requiring a fixed image/object distance ratio (r'/r) resulting in focal planes oriented normal to the optical axis.…”

Section: A Aplanatismmentioning

confidence: 99%

Aplanatic grazing incidence diffraction grating: a new optical element

1986

Appl. Opt.

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We present the theory of a grazing incidence reflection grating capable of imaging at submicron resolution. The optic is mechanically ruled on a spherical or cylindrical surface with varied groove spacings, delivering diffraction-limited response and a wide field of view at a selected wavelength. Geometrical aberrations are calculated on the basis of Fermat's principle, revealing significant improvements over a grazing incidence mirror. Aplanatic and quasi-aplanatic versions of the grating have applications in both imaging and scanning microscopes, microprobes, collimators, and telescopes. A 2-D crossed system of such gratings, similar to the grazing incidence mirror geometry of Kirkpatrick and Baez, could potentially provide spatial resolutions of-2o0 A.

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Section: A Aplanatismmentioning

confidence: 99%

Aplanatic grazing incidence diffraction grating: a new optical element

1986

Appl. Opt.

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“…A variation of the type I Wolter design [16], [17], in which the parabolic surface is replaced by an ellipsoid, has found application for collecting the radiation at 13.5 nm emitted from a small hot plasma used as a source in Extreme UltraViolet (EUV) microlithography [18]- [21], currently considered a promising technology in the semiconductor industry for the next generation lithographic tools. More recently, a new optical design has recently been proposed [22], [23] in which the above condition on the two reflection angles is satisfied for all rays incident on each mirror.…”

Section: Introductionmentioning

confidence: 99%

An alternative optical design for x-ray telescopes

Zocchi

Vernani

2007

SPIE Proceedings

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A two-reflection optical design for nested X-ray telescopes is described in which the two grazing incidence angles are equal for each ray collected by each mirror, so that the total reflectivity is maximized. A specific design is discussed and its optical performances are compared to a reference type I Wolter optics. In the selected design scenario, a 16% reduction in the number of mirror shells and a 6% increase of the effective area between 1 keV and 10 keV is achieved, along with a small 2.6% decrease of the angular resolution over 12 armin field of view.

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“…For applications to EUV lithography, where the source is at finite distance, a variation of the type I Wolter design, already proposed for other applications [23], [24] is used. In this configuration, the parabolic surface is replaced by an ellipsoid, so that the object focus is brought to finite distance from the optics.…”

Section: Introductionmentioning

confidence: 99%

Comparison of optical performances of alternative grazing incidence collector designs for EUV lithography

Zocchi

Benedetti

2007

SPIE Proceedings

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Two designs of grazing incidence collectors for EUV lithography are described as alternative solutions to the type I Wolter configuration. The main purposes of the designs are the improvement of collection efficiency and the increase in the flexibility with which the design can be adapted and adjusted to the boundary specifications set by the source and the illuminator. With reference to a specific scenario, examples of these designs and their performances are presented, discussed, and compared to what can be achieved with a Wolter collector. In this scenario, one of the designs offers the possibility to achieve large collection efficiency with a limited number of mirrors as opposed to the Wolter case where high values of the collection efficiency are possible provided the number of mirrors is increased.

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A Grazing Incidence Microscope for X‐ray Imaging Applications

Cited by 14 publications

References 3 publications

Aplanatic grazing incidence diffraction grating: a new optical element

Aplanatic grazing incidence diffraction grating: a new optical element

An alternative optical design for x-ray telescopes

Comparison of optical performances of alternative grazing incidence collector designs for EUV lithography

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