A global model of the self-pulsing regime of micro-hollow cathode discharges

Lazzaroni, Claudia; Chabert, Pascal

doi:10.1063/1.3690943

Cited by 22 publications

(35 citation statements)

References 42 publications

(55 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In this study, a particular type of microplasma source is used, the Micro Hollow Cathode Discharge (MHCD). 15 MHCDs are known to produce high electron densities, 16,17 which is a favorable condition to optimize the dissociation of N 2 molecules, a prerequisite for the synthesis of nitride materials at relatively low temperatures. The discharge is ignited in Ar/N 2 mixtures to produce atomic nitrogen, and the boron precursor used is boron tribromide (BBr 3 ), which is liquid at room temperature.…”

mentioning

confidence: 99%

A microplasma process for hexagonal boron nitride thin film synthesis

Kabbara

Kasri

Brinza

et al. 2020

Applied Physics Letters

Self Cite

View full text Add to dashboard Cite

A process based on microplasmas generated in Ar/N 2 mixtures for nanomaterial synthesis is described in this Letter. The targeted material is hexagonal boron nitride (h-BN) that is in high demand for electronic and optoelectronic applications. The synthesis of high crystalline quality h-BN films over large areas still remains a challenge. In this study, a nanosecond pulsed high voltage is applied between two electrodes separated by a dielectric layer, with the whole system being drilled by a 400 lm diameter hole (micro hollow cathode structure). This geometry allows for an efficient dissociation of N 2 gas, a particularly important asset for the synthesis of nitride materials, which normally requires very high deposition temperatures ($1300 C). In this work, we report the growth of h-BN on 2-in. silicon substrates at temperatures below 1000 C, with a growth rate of about 30 nm/h, using this approach. The deposited films are characterized by Raman and electron energy loss spectroscopies and transmission electron microscopy to evaluate the phase purity, the quality, the surface morphology, and the crystallinity of the material. The films exhibit a stoichiometry very close to 1 with a crystalline domain size of about 3 nm.

show abstract

mentioning

confidence: 99%

A microplasma process for hexagonal boron nitride thin film synthesis

Kabbara

Kasri

Brinza

et al. 2020

Applied Physics Letters

Self Cite

View full text Add to dashboard Cite

show abstract

“…4 to address the limitations of the previously published models. [9][10][11][12] The experimental data presented in the previous section indicated negative differential impedance with a capacitive effect due to temporal current and voltage characteristics during charge-discharge cycles. To reflect these characteristics, the MHCD reactor was modeled as a negative differential resistor, R d , in parallel with a capacitor, C d .…”

Section: B Equivalent Circuit Modelmentioning

confidence: 94%

“…(1), where A 3 is another empirical constant. 12,13 The authors also included an additional capacitor in parallel with C d to represent the stray capacitance of the experimental setup 12 and stated that the stray inductance of the circuit was negligible. 11 Although their model satisfactorily predicted the voltage characteristics of MHCD reactor, it predicted the magnitude of current with errors over 100%.…”

Section: Current State Of Knowledgementioning

confidence: 99%

Electrical characterization and an equivalent circuit model of a microhollow cathode discharge reactor

Taylan

Berberoğlu

2014

Journal of Applied Physics

View full text Add to dashboard Cite

This paper reports the electrical characterization and an equivalent circuit of a microhollow cathode discharge (MHCD) reactor in the self-pulsing regime. A MHCD reactor was prototyped for air plasma generation, and its current-voltage characteristics were measured experimentally in the self-pulsing regime for applied voltages from 2000 to 3000 V. The reactor was modeled as a capacitor in parallel with a variable resistor. A stray capacitance was also introduced to the circuit model to represent the capacitance of the circuit elements in the experimental setup. The values of the resistor and capacitors were recovered from experimental data, and the proposed circuit model was validated with independent experiments. Experimental data showed that increasing the applied voltage increased the current, self-pulsing frequency and average power consumption of the reactor, while it decreased the peak voltage. The maximum and the minimum voltages obtained using the model were in agreement with the experimental data within 2.5%, whereas the differences between peak current values were less than 1%. At all applied voltages, the equivalent circuit model was able to accurately represent the peak and average power consumption as well as the self-pulsing frequency within the experimental uncertainty. Although the results shown in this paper was for atmospheric air pressures, the proposed equivalent circuit model of the MHCD reactor could be generalized for other gases at different pressures.

show abstract

“…A scintillator disk can also be used to image the shape of the electron beam. The discharge process can be described with a circuit model [25,26], as shown in Fig. 2, where ℎ and are charging resistor and voltage applied to the external capacitor .…”

Section: Configuration Of Ps Discharge Experimentsmentioning

confidence: 99%

Characteristics of Pseudospark Discharge in Particle-in-Cell Simulations

Zhang

Chen

et al. 2021

IEEE Trans. Electron Devices

View full text Add to dashboard Cite

In this paper, the characteristics of the pseudospark (PS) discharge were studied through particle-in-cell simulations with the consideration of the external circuit. The different discharge stages, including the Townsend discharge, hollowcathode discharge and super-dense glow, were characterized by the discharge voltage and current. The sources of electrons at different discharge stages were analyzed, with the electrons generated from the ionization of the background gas playing the dominant role. The electron densities at the Townsend discharge, hollow-cathode discharge and super-dense glow discharge stages were in the range of 10 13 m -3 , 10 18 m -3 and 10 20 m -3 , respectively. The energy of the electron beam extracted at the anode aperture at the different discharge phases was exported and post-processed. The electron beams generated at the three stages have an energy spread of 10%, 20% and 40%, respectively. The hollow-cathode discharge phase has balanced parameters in beam energy, energy spread, and electron density in contrast to the Townsend discharge and super-dense glow discharge stage.

show abstract

A global model of the self-pulsing regime of micro-hollow cathode discharges

Cited by 22 publications

References 42 publications

A microplasma process for hexagonal boron nitride thin film synthesis

A microplasma process for hexagonal boron nitride thin film synthesis

Electrical characterization and an equivalent circuit model of a microhollow cathode discharge reactor

Characteristics of Pseudospark Discharge in Particle-in-Cell Simulations

Contact Info

Product

Resources

About