“…Recently, Ustarroz proposed the so-called "generalized electrochemical aggregative growth mechanism" [33], comprising nucleation of metal clusters, their growth to a critical (limited by adsorption) size, followed by their surface diffusion, aggregation, coalescence, and recrystallization. Since, diffusion on the support surface must depend on its type and topography, the similarity of the deposition transients on the GC and HOPG supports in this We assume that secondary crystals nucleate at the surface of Pt particles, whose primary growth beyond a certain size is hindered by adsorption of either chloride ions (in this work at potentials E d > 0.060 V vs. RHE), or hydrogen adatoms (E d < 0.060 V vs. RHE when the H UPD coverage is high).…”