A generalized algebraic equation for the pull-in condition in micromachined electrostatic micromirrors: modeling and characterization

Bochobza-Degani, O.; Seter, D.; Socher, Eran; Nemirovsky, Y.

doi:10.1109/eeei.2000.924457

Cited by 2 publications

(3 citation statements)

References 3 publications

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“…For torsion actuators it is well known, and for example shown in [ 1], that a stable deflection (measured at an edge of the actuator element) up to the full width of the gap is possible. This kind of solution, however, has a large penalty in electrode area and leverage, as essentially the effective actuating area of the moving element may still only use a small fraction of the gap height.…”

Section: Torsion Actuatorsmentioning

confidence: 98%

“…This issue is well known and is often called 'pull-in' and occurs in this simple case for x pi = h/3. A short, but quite general treatment of this effect can be found in [ 1]. The deflection in piezoelectric and thermal actuators, on the other hand, is usually quite stable: for any input signal there is a stable equilibrium of internal forces and that is reassumed after a disturbance by an external force or additional deflection.…”

Section: Introductionmentioning

confidence: 98%

“…The useful range with some positive stability might be just one fourth or less of the gap width, depending on the application and the precision of manufacturing. The reason for the meta-stability of the equilibrium is the positive force feedback in the actuator, see Figure 2 and equation (1). The electrostatic force F el is proportional to the square of the applied voltage divided by the actual plate distance.…”

Section: Introductionmentioning

confidence: 99%

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Micro-actuator with extended analog deflection at low drive voltage

et al. 2006

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Electrostatic Micro-actuators are being increasingly used for a wide variety of applications such as spatial light modulators, scanning mirrors, optical cross connects, micro-valves, and others. Usually the electrical forces operate in one direction and are balanced by a mechanical spring. The resulting deflection is then either defined by a mechanical stop, or it is only a meta-stable equilibrium position: at an additional external force or deflection it will snap to a different position, frequently again defined by a mechanical stop. This issue is well known and is often called 'pull-in'. In the often used parallel-plate capacitor actuator, the instability already begins at a deflection of only on third of the original capacitor plate separation. For safety reasons and due to the steep response-curve one can only use an even smaller fraction of the mechanically possible movement. This means, that the gap below the actuator has to be designed very much larger than the required maximum deflection. To get the pre-described force and deflection, a much higher voltage is needed than for potential smaller gap widths. The useable range of deflection for many types of micro-actuators can be extended without the penalty of large drive voltage or low shock resistivity, by employing springs with steeper-than-linear restoring force. Alternatively, the voltage needed for a given range of deflection may be reduced. This paper shows the benefits and how to design and dimension these types of springs.

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Section: Torsion Actuatorsmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

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Micro-actuator with extended analog deflection at low drive voltage

et al. 2006

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Two-Axis Single-Crystal Silicon Micromirror Arrays

Dokmeci

Pareek

Bakshi

et al. 2004

J. Microelectromech. Syst.

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This paper presents the design, fabrication, and testing of a two-axis 320 pixel micromirror array. The mirror platform is constructed entirely of single-crystal silicon (SCS) minimizing residual and thermal stresses. The 14-m-thick rectangular (750 800 m 2 ) silicon platform is coated with a 0.1-m-thick metallic (Au) reflector. The mirrors are actuated electrostatically with shaped parallel plate electrodes with 86 m gaps. Large area 320-mirror arrays with fabrication yields of 90% per array have been fabricated using a combination of bulk micromachining of SOI wafers, anodic bonding, deep reactive ion etching, and surface micromachining. Several type of micromirror devices have been fabricated with rectangular and triangular electrodes. Triangular electrode devices displayed stable operation within a ( 5 , 5 ) (mechanical) angular range with voltage drives as low as 60 V.[1124]Index Terms-Al etching, deep-reactive ion etching (DRIE), micromirrors, optical switching, silicon on insulator (SOI) wafers.

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A generalized algebraic equation for the pull-in condition in micromachined electrostatic micromirrors: modeling and characterization

Cited by 2 publications

References 3 publications

Micro-actuator with extended analog deflection at low drive voltage

Micro-actuator with extended analog deflection at low drive voltage

Two-Axis Single-Crystal Silicon Micromirror Arrays

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