2014
DOI: 10.1002/adma.201305249
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A General Strategy for Assembling Nanoparticles in One Dimension

Abstract: Alignment of 1D assemblies of a wide variety of nanoparticles (e.g., metal, metal oxide, semiconductor quantum dots, or organic microspheres) in one direction upon diverse substrates (including industrial silicon wafers and transparent glass plates) by a general strategy is demonstrated. This sandwich method provides an efficient way of rapidly and precisely assembling nanoparticles on a large scale (up to 10 cm × 10 cm) for device applications.

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Cited by 94 publications
(101 citation statements)
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“…Parts c and c′ of Scheme 1 show the procedure of fabricating nanopillar and nanohole arrays with the obtained colloidal stripes as an etching mask or template. The nanopillar arrays were obtained by dry etching from the as-prepared colloidal stripes on a silicon wafer in the chamber of a PlasmaLab System100 (Oxford Instruments) with etchant gases of SF 6 and C 4 F 8 at flow rates of 12 and 27 sccm, an RF power of 700 W, and a bias voltage of 25 V. The etching duration ranged from 30 to 120 s to produce nanopillar arrays with various morphologies. The nanohole arrays were formed by dry etching, similar to the fabrication procedure for nanopillar arrays, the main difference lying in the prior process of sputtering deposition of 100 nm thick aluminum and the lift-off process to remove the colloidal stripe template.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…Parts c and c′ of Scheme 1 show the procedure of fabricating nanopillar and nanohole arrays with the obtained colloidal stripes as an etching mask or template. The nanopillar arrays were obtained by dry etching from the as-prepared colloidal stripes on a silicon wafer in the chamber of a PlasmaLab System100 (Oxford Instruments) with etchant gases of SF 6 and C 4 F 8 at flow rates of 12 and 27 sccm, an RF power of 700 W, and a bias voltage of 25 V. The etching duration ranged from 30 to 120 s to produce nanopillar arrays with various morphologies. The nanohole arrays were formed by dry etching, similar to the fabrication procedure for nanopillar arrays, the main difference lying in the prior process of sputtering deposition of 100 nm thick aluminum and the lift-off process to remove the colloidal stripe template.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…The solution or suspension of nanomaterials has been restricted in the mezzanine space, which lies between a flat substrate with low surface energy (such as poly(dimethylsiloxane) (PDMS) films or octadecyltrichlorosilane‐treated silicon wafer)) and a pillar‐patterned silicon template (Figure b). With the evaporation of solvent, micropillar arrays which served as the pinpoints of curved liquid body will guide the liquid–solid–gas three‐phase contact line (TCL) to spread at the designed direction. Micrometer scaled liquid patterns among micropillars have been achieved, which are the consequence of the simple area‐minimizing principle.…”
mentioning
confidence: 99%
“…The latter can also be employed in mechanical contexts, for example, as flexible artificial flagella or cilia141516. Compared to other methodologies such as lithography217, cluster-assisted assembly18 and colloidal polymerization19, field-directed assembly in electro- or magneto-rheological fluids2021 provides a simple, efficient22 and controllable approach for particle chain formation. However, it suffers from two major limitations that hinder its application, for example, in electronic-device manufacturing.…”
mentioning
confidence: 99%