2016
DOI: 10.1109/ted.2016.2578325
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A Fitting Model for Asymmetric <inline-formula> <tex-math notation="LaTeX">$I$ </tex-math> </inline-formula>–<inline-formula> <tex-math notation="LaTeX">$V$ </tex-math> </inline-formula> Characteristics of Graphene FETs for Extraction of Intrinsic Mobilities

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Cited by 13 publications
(6 citation statements)
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“…In the calculations, we take into account the quantum capacitance correction [48], fringing, and plasma leakage as predicted by the phenomenological model described later in the work and in Supplemental Material [51]. One can see that the theoretical calculations made without any fitting parameters reproduce relatively well the absolute values and the functional gate-voltage dependencies of the plasma frequency for all four cavities, close to ¼ power dependence.…”
Section: A Resonant Plasmons At Zero Drain Current Conditionsmentioning
confidence: 86%
See 1 more Smart Citation
“…In the calculations, we take into account the quantum capacitance correction [48], fringing, and plasma leakage as predicted by the phenomenological model described later in the work and in Supplemental Material [51]. One can see that the theoretical calculations made without any fitting parameters reproduce relatively well the absolute values and the functional gate-voltage dependencies of the plasma frequency for all four cavities, close to ¼ power dependence.…”
Section: A Resonant Plasmons At Zero Drain Current Conditionsmentioning
confidence: 86%
“…Knowing the total parasitic resistance R 0 , we can extract sample averaged conductivity σ ¼ ðL ch =WÞ= ðR − R 0 Þ, where L ch is the total channel length, W is the average channel width, and R is the total resistance. The carrier mobility μ i can be calculated from the equation [29,48] for details). The electron and hole density n i and p i (index i ¼ 1, 2 numerates regions with high and low conductivity, respectively) as a function of the back-gate voltage can be calculated using the parallel-plate capacitor model with the correction by the quantum capacitance of graphene.…”
Section: A Samplesmentioning
confidence: 99%
“…The current changes very slowly when the gate voltage is positively biased. The asymmetric I-V characteristics of the two GFETs could be a result of the thermoionic emission and interband tunneling at the junctions between the gated and access regions [21]. The resistance of the graphene on the 100 W sputtered MnZn ferrite thin film is much smaller than that on the 150 W sputtered thin film at the same gate bias, as compared in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Knowing the total parasitic resistance R 0 we can extract sample averaged conductivity σ = (L ch /W )/(R − R 0 ), where L ch is the total channel length, W is the average channel width, R is the total resistance. The carrier mobility µ i can be calculated from equation eµ i (n i +p i ) = σ i (see [26,44] for details). The electron and hole density n i and p i (index i = 1, 2 numerates regions with high and low conductivity, respectively) as a function of the back gate voltage can be calculated using the parallelplate capacitor model with the correction by the quantum capacitance of graphene.…”
Section: A Samplesmentioning
confidence: 99%
“…In the calculations we have taken into account the quantum capacitance correction [44], fringing and plasma leakage as predicted by phenomenological model described later in the work and in the supplementary materials. One can see that the theoretical calculations made without any fitting parameters reproduce relatively well the absolute values and the functional gate voltage dependencies of the plasma frequency for all four cavities, close to 1 /4 power dependence.…”
Section: A Resonant Plasmons At Zero Drain Current Conditionsmentioning
confidence: 99%