A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere‐forming block copolymer directed self‐assembly

Xiao, Shuaigang; Yang, XiaoMin; Hwu, Justin J.; Lee, Kim Y.; Kuo, David

doi:10.1002/polb.23433

Cited by 11 publications

(15 citation statements)

References 29 publications

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“…To overcome this limitation, chemically patterned substrates 25−29 or a combination of topographic patterning with the epitaxial self-assembly 30 have been developed, so that the grain size can be increased to 100 μm by 100 μm. 26,29 In an alternative approach, several types of minimal topographic patterns, such as shallow trenches, 31,32 dot patterns with low topography, 33,34 or sinusoidal patterns, 35 have been used in the DSA process.…”

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confidence: 99%

Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

et al. 2016

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We demonstrate that a minimal topographic pattern with a confinement depth (D) much less than the domain spacing of block copolymers (L0) can be used to achieve highly ordered hexagonal arrays or unidirectionally aligned line patterns over large areas. Cylinder-forming poly(styrene-b-ethylene oxide) (PS-b-PEO) thin films were prepared on a series of minimal single trench patterns with different widths (W) and D. Upon thermal annealing, hexagonal arrays of cylindrical microdomains propagated away from the edges of a single trench, providing insight into the minimum pitch (P) of the trench necessary to fully order hexagonal arrays. The confinement trench D of 0.30L0, the W in the range of 1.26L0 to 2.16L0, and the P as long as 18.84L0 were found to be effective for the generation of laterally ordered hexagonal arrays with the density amplification up by a factor of 17, within the minimally patterned trench surfaces of 100 μm by 100 μm. Furthermore, we produced line patterns of cylindrical microdomains by using solvent vapor annealing on the minimally patterned trench surfaces. However, highly aligned line patterns could be achieved only on the patterned surface with P = 5.75L0, W = 1.26L0, and D = 0.30L0 because the influence of the minimally patterned trench surface on the lateral ordering decreased as the P and W increase at the fixed D, resulting in poor ordering. These findings suggest that the minimal topographic pattern is more effective in guiding hexagonal arrays than in guiding line patterns.

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confidence: 99%

Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

et al. 2016

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“…11(c), the finished sub-master templates will have many sectors, and each sector includes both circumferential lines and servo patterns. Other options include the ability to incorporate independent lower density patterns fabricated by conventional lithography and by masking the DSA patterns out of the servo sectors, as shown in Section IV-D and [76]. e) Line Roughness.…”

Section: ) Design Requirements For Self-assembled Patternsmentioning

confidence: 99%

Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance

et al. 2015

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Bit Patterned Media (BPM) for magnetic recording provides a route to thermally stable data recording at >1 Tb/in 2 and circumvents many of the challenges associated with extending conventional granular media technology. Instead of recording a bit on an ensemble of random grains, BPM is comprised of a well ordered array of lithographically patterned isolated magnetic islands, each of which stores one bit. Fabrication of BPM is viewed as the greatest challenge for its commercialization. In this article we describe a BPM fabrication method which combines rotary-stage e-beam lithography, directed self-assembly of block copolymers, self-aligned double patterning, nanoimprint lithography, and ion milling to generate BPM based on CoCrPt alloy materials at densities up to 1.6 Td/in 2 (teradot/inch 2 ). This combination of novel fabrication technologies achieves feature sizes of <10 nm, which is significantly smaller than what conventional nanofabrication methods used in semiconductor manufacturing can achieve. In contrast to earlier work which used hexagonal closepacked arrays of round islands, our latest approach creates BPM with rectangular bitcells, which are advantageous for integration of BPM with existing hard disk drive technology. The advantages of rectangular bits are analyzed from a theoretical and modeling point of view, and system integration requirements such as provision of servo patterns, implementation of write synchronization, and providing for a stable head-disk interface are addressed in the context of experimental results. Optimization of magnetic alloy materials for thermal stability, writeability, and tight switching field distribution is discussed, and a new method for growing BPM islands from a specially patterned underlayer -referred to as "templated growth" -is presented. New recording results at 1.6 Td/in 2 (roughly equivalent to 1.3 Tb/in 2 ) demonstrate a raw error rate <10 -2 , which is consistent with the recording system requirements of modern hard drives. Extendibility of BPM to higher densities, and its eventual combination with energy assisted recording are explored.Index Terms-Bit patterned media, hard disk drive, block copolymer, self-assembly, double patterning, e-beam lithography, sequential infiltration synthesis, nanoimprint lithography, templated growth, thermal annealing, Co alloys, magnetic multilayers, interface anisotropy, magnetic recording, write synchronization, prepatterned servo, areal density.

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“…Block copolymer (BCP) thin films with microdomains oriented normal to the substrate have applications as lithographic templates or scaffolds for the fabrication of high‐density nanodots/nanowires, bit‐patterned media, and logic devices. One of the great challenges that limits the application of BCP nanolithography is that the defect density is far beyond the tolerance set by the semiconductor industry.…”

Section: Introductionmentioning

confidence: 99%

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Sun

Russell

2017

J Polym Sci B Polym Phys

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Solvent vapor annealing (SVA) is one route to prepare block copolymer (BCP) thin films with long‐range lateral ordering. The lattice defects in the spin‐coated BCP thin film can be effectively and rapidly reduced using SVA. The solvent evaporation after annealing was shown to have a significant impact on the in‐plane ordering of BCP microdomains. However, the effect of solvent evaporation on the out‐of‐plane defects in BCPs has not been considered. Using grazing‐incidence x‐ray scattering, the morphology evolution of lamellae‐forming poly(2‐vinlypyridine)‐b‐polystyrene‐b‐poly(2vinylpyridine) triblock copolymers, having lamellar microdomains oriented normal to substrate surface during SVA, was studied in this work. A micelle to lamellae transformation was observed during solvent uptake. The influence of solvent swelling ratio and solvent removal rate on both the in‐plane and out‐of‐plane defect density was studied. It shows that there is a trade‐off between the in‐plane and out‐of‐plane defect densities during solvent evaporation. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017, 55, 980–989

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A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere‐forming block copolymer directed self‐assembly

Cited by 11 publications

References 29 publications

Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns

Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance

In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

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