2023
DOI: 10.1016/j.solmat.2022.112112
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A facile photolithography process enabling pinhole-free thin film photovoltaic modules on soda-lime glass

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Cited by 8 publications
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“…These techniques are utilized to deposit alternating layers of dielectric materials onto a substrate, ultimately forming the periodic structure of the photonic crystal. Photolithography is then used to define the precise geometry and pattern of the layers [9]. Etching processes, such as reactive ion etching (RIE) or wet etching, are subsequently applied to selectively remove material, shaping the layers according to the designed structure.…”
Section: Introductionmentioning
confidence: 99%
“…These techniques are utilized to deposit alternating layers of dielectric materials onto a substrate, ultimately forming the periodic structure of the photonic crystal. Photolithography is then used to define the precise geometry and pattern of the layers [9]. Etching processes, such as reactive ion etching (RIE) or wet etching, are subsequently applied to selectively remove material, shaping the layers according to the designed structure.…”
Section: Introductionmentioning
confidence: 99%
“…Patterning processes are crucial for manufacturing electronic devices, among which the most commonly used process for scientific research and in industries is photolithography. [1,2] Photolithography has already been well tested and is employed for the mass production of materials requiring high precision, such as semiconductors and displays. However, photolithography has several limitations, including high production costs and large space requirements, when applied for manufacturing printed electronics in small quantities.…”
Section: Introductionmentioning
confidence: 99%