“…Traditionally, silicon is a widely used construction material for the fabrication of M/NEMS devices and, hence, most of the investigations are directed towards enhancing its tribological performance [1,4,5]. Many studies have shown that surface nanopatterning is an effective way to reduce adhesive and friction forces on micro/nano-scale, due to reduction of contact area [6][7][8][9][10]. Various methods, such as ion-beam roughening [11], focused-ion-beam milling (FIB) [12,13], template printing [6,10], current-induced local anodic oxidation [14], and others [15][16][17][18], are commonly used to fabricate micro/nano-structures.…”