2012
DOI: 10.1007/s00542-012-1619-5
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A dual step precision multi-DOF stage for maskless digital lithography

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Cited by 6 publications
(1 citation statement)
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“…The micro-positioning stage is considered an important element in modern and future technologies, especially in microand nano-environments. It has been widely used in various applications such as in atomic force microscopy [1], scanning microscopic interferometry [2], micro-and nano-surgical tools [3], maskless lithography [4], and scanning probe microscopy [5]. In addition, many other micro-and nanopositioning stage applications have also been reported in [6][7][8].…”
Section: Introductionmentioning
confidence: 99%
“…The micro-positioning stage is considered an important element in modern and future technologies, especially in microand nano-environments. It has been widely used in various applications such as in atomic force microscopy [1], scanning microscopic interferometry [2], micro-and nano-surgical tools [3], maskless lithography [4], and scanning probe microscopy [5]. In addition, many other micro-and nanopositioning stage applications have also been reported in [6][7][8].…”
Section: Introductionmentioning
confidence: 99%