2006
DOI: 10.1016/j.nima.2006.05.199
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A double junction model of irradiated silicon pixel sensors for LHC

Abstract: In this paper, we discuss the measurement of charge collection in irradiated silicon pixel sensors and the comparison with a detailed simulation. The simulation implements a model of radiation damage by including two defect levels with opposite charge states and trapping of charge carriers. The modeling proves that a doubly peaked electric field generated by the two defect levels is necessary to describe the data and excludes a description based on acceptor defects uniformly distributed across the sensor bulk.… Show more

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Cited by 22 publications
(27 citation statements)
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“…the electric field is negligible. An interesting feature is an increase of the high electric field close to the back implant and to the trench: this is a known effect called double peak (DP) [21]. The fact that it is accounted for by our simulation supports the reliability of the simulation itself.…”
Section: Electric Field Distributionsupporting
confidence: 68%
“…the electric field is negligible. An interesting feature is an increase of the high electric field close to the back implant and to the trench: this is a known effect called double peak (DP) [21]. The fact that it is accounted for by our simulation supports the reliability of the simulation itself.…”
Section: Electric Field Distributionsupporting
confidence: 68%
“…Investigations of the electric field profile in the bulk of irradiated silicon sensors have shown that the electric field is no longer linear with the bulk depth after irradiation (see, for example, Refs. [43,44]). Irradiated planar sensors with non-linear profiles are simulated using the Chiochia model [44], implemented in the Silvaco TCAD package [42,45].…”
Section: Simulation Detailsmentioning
confidence: 99%
“…There is no known recipe to include the annealing effects presented in Section 3.2 in TCAD-based predictions. One challenge for incorporating annealing effects is that both the Hamburg and TCAD models are motivated by multiple effective traps [11,43,44] and the effective states are not in one-to-one correspondence (in particular, no cluster defects are directly reproduced by TCAD simulations). In addition to this, the relative abundance of the measured acceptor-like traps changes with annealing.…”
Section: Effective Modelling Of Annealing Effects In Tcad Simulationsmentioning
confidence: 99%
“…This change is due to defects that act as permanent acceptors. There is however a second effect that is also very important: there is experimental evidence [14], supported by simulation studies [15], that the leakage current fills traps in the bulk (i.e. electrons and holes are trapped in the defects of the bulk) changing the doping profile.…”
Section: Pos(ifd2015)026mentioning
confidence: 99%