Abstract:It is well known that dishing occurring in chemical mechanical polishing of plug structures leads to considerable wafer surface non-planarity and reduces the current/charge conduction. Thus, a closed-form solution for quantitative prediction of dishing is needed. A contact-mechanics-based approach to describe the steady-state dishing occurring in chemical mechanical polishing of plug structures is presented. The model is then applied to investigate the effect of pattern geometry on dishing in details. It was s… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.