2024
DOI: 10.4271/2023-01-5134
|View full text |Cite
|
Sign up to set email alerts
|

A Direct Current Magnetron Sputtering Study of the Shape Memory Properties of Aluminum/Silicon Alloy Thin Films

J. Francis Xavier,
A. Rethinavelsubramanian,
D. Jayabalakrishnan
et al.

Abstract: <div class="section abstract"><div class="htmlview paragraph">Using dc magnetron sputtering, Al/Si films were made on surfaces made of fused quartz and silicon. It was carefully controlled that the films contained no more than 7 at.% silicon under ideal deposition conditions. This was done by changing the target's structure and adding silicon lines to it. This had to be done to get a good reading on how much silicon was… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 13 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?