2017
DOI: 10.1134/s1063785017010266
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A diffraction grating created in diamond substrate by boron ion implantation

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Cited by 7 publications
(4 citation statements)
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“…The effect has been shown to be suitable for the generation of customized three-dimensional surface patterns by irradiation with a proper mask [8], based on the knowledge accumulated in previous works on the response of single-crystal diamond to irradiation under different conditions [3]. A similar effect has also been seen using low-energy heavy ions and a diffraction optical element has been manufactured using high-dose implantation in diamond of 40 keV boron ions through a surface mask [9].…”
Section: Introductionmentioning
confidence: 84%
“…The effect has been shown to be suitable for the generation of customized three-dimensional surface patterns by irradiation with a proper mask [8], based on the knowledge accumulated in previous works on the response of single-crystal diamond to irradiation under different conditions [3]. A similar effect has also been seen using low-energy heavy ions and a diffraction optical element has been manufactured using high-dose implantation in diamond of 40 keV boron ions through a surface mask [9].…”
Section: Introductionmentioning
confidence: 84%
“…diamond by Stepanov et al [68]. Boron ions with an energy of 40 keV were implanted with a high fluence of 1.43 × 10 18 ion/ cm 2 , masked by nickel grid with 40 μm square openings.…”
Section: X-raymentioning
confidence: 99%
“…(a) E-beam patterned dense gratings fabricated a chrome hardmask[66]. (b) Selectively boron-implanted and graphitized diamond diffraction grating[68].…”
mentioning
confidence: 99%
“…We present diffraction gratings with sidewalls along the {100} and {111} planes, following our previous demonstration of this fabrication method to manufacture beamsplitters with trapezoidal profile [34]. Diffraction gratings in diamond have been previously published using directional anisotropic etching, exploitation of mask redeposition [36], boron implantation [37] and for X-ray applications [38]. Compared to these fabrication methods, crystallographic etching allows precise control of angles, produces smooth sidewalls free of ion damage and enables high aspect ratio gratings using commonly available microfabrication equipment.…”
Section: Introductionmentioning
confidence: 99%