A degradable polycyclic cross-linker for UV-curing nanoimprint lithography

Hu, Xin; Yang, Tao; Gu, Ronghua; Cui, Yushuang; Yuan, Changsheng; Ge, Haixiong; Wu, Wei; Li, Wendi; Chen, Yanfeng

doi:10.1039/c3tc32048k

Cited by 20 publications

(13 citation statements)

References 21 publications

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“…However, the vast majority of these cross-linkers are labile to acidic hydrolysis conditions, with only one example of cross-linker being readily amenable to cleavage under basic conditions. Regarding the former type of cross-linkers, these include several acetal di(meth)acrylates or diacrylamides, [3][4][5][6][7][8][9][10][11][12][13][14][15] hemiacetal ester dimethacrylates, 16,17 ketal di(meth)acrylates, diacrylamides, or di(N-vinylformamides), [18][19][20][21][22][23][24][25][26] silyl ether di(meth)acrylates, 27,28 and tertiary ester di(meth)acrylates. [29][30][31][32][33] Regarding the latter type, the only example of cross-linker spontaneously degradable under alkaline hydrolysis conditions is, to the best of our knowledge, tetrafluorophenylene diacrylate, 34 which is very costly to prepare because of its perfluorinated ring.…”

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confidence: 99%

A dimethacrylate cross-linker cleavable under thermolysis or alkaline hydrolysis conditions: synthesis, polymerization, and degradation

Elladiou

Patrickios

2016

Chem. Commun.

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We develop a new platform based on 2,6-pyridinediethanol diesters for introducing polymer degradability under thermolysis or alkaline hydrolysis conditions, with the latter being rare in polymers. Such labile diesters can be cross-linkers, bifunctional initiators and inimers. We demonstrate the power of this platform through the synthesis of the 2,6-pyridinediethanol dimethacrylate cross-linker, its controlled (co)polymerization, and the thermal and hydrolytic cleavage of its (co)polymers.

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confidence: 99%

A dimethacrylate cross-linker cleavable under thermolysis or alkaline hydrolysis conditions: synthesis, polymerization, and degradation

Elladiou

Patrickios

2016

Chem. Commun.

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“…Z‐shrinkage was calculated by measuring the difference in thicknesses of the UV‐curable material spin‐coated on silicon wafer before and after the UV‐curing process. In our previous study, compared with the lateral shrinkage, the Z‐shrinkage of the UV‐curable film contributed mostly to volume shrinkage . Figure e shows the experimental shrinkages of film thicknesses of DP resist and other three UV‐curable acrylated materials after the UV‐curing process (DP resist, 1.35%; DAMTT, 2.48%; pentaerythritol triacrylate, 4.17%; CN975, 7.08%; CN996, 6.17%).…”

Section: Resultsmentioning

confidence: 84%

“…2,10‐Diacryloyloxymethyl‐1,4,9,12‐tetraoxaspiro[4.2.4.2] tetradecane was made in our laboratory . Pentaerythritol tetra (3‐mercaptopropionate) (PETMP) was purchased from Sigma–Aldrich.…”

Section: Methodsmentioning

confidence: 99%

“…Recently, we have developed a degradable polycyclic diacrylate cross‐linker, 2,10‐diacryloyloxymethyl‐1,4,9,12‐tetraoxaspiro[4.2.4.2] tetradecane (DAMTT) . Metal gratings are successfully fabricated on the cylindrical surface of an optical fiber via UV soft nanoimprint and the lift‐off process because the cross‐linked DAMTT is able to decompose in hot acid medium and serve as a sacrificial layer.…”

Section: Introductionmentioning

confidence: 99%

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An Oxygen‐Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV‐Nanoimprint Lithography

Huang

et al. 2014

Macromol. Rapid Commun.

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In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, com-prising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxa-spiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer.

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“…UV‐curing soft nanoimprint lithography using soft polymeric stamps has been widely used to fabricate nanopatterns on both planar and curved surfaces . Adhesion between mould and the imprinted resist is greatly improved due to the high density of the nanoscale structure.…”

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A Tunable Nanoimprint System to Create New Features

Zhang

Shen

et al. 2018

Macro Materials & Eng

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Fabrication of different patterns based on the same nanoimprint mould is very attractive due to the time and cost consumption of fabricating hard mould. This paper demonstrates a tunable photo‐curing nanoimprint system to create new features based on the same polydimethylsiloxane (PDMS) mould and a Ti‐containing resist synthesized by titanium (IV) ethoxide and 2‐(methacryloyloxy)ethyl acetoacetate. The resist exhibits very high oxygen RIE resistance and is able to take the place of traditional polysiloxance based resists to fabricate high‐aspect‐ratio patterns. The resist also has a low shrinkage (about 2.45%) and a high Young’s modulus of 10.85 GPa after photo‐curing. High polarity contrast of PDMS and Ti‐resist makes the release process freely and PDMS mould can be directly used without further anti‐stick treatment. A number of new features are imprinted into Ti‐resist based on the same PDMS mould by controlling the deformation and the stretched PDMS mould can be repeatedly used after relaxation.

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A degradable polycyclic cross-linker for UV-curing nanoimprint lithography

Cited by 20 publications

References 21 publications

A dimethacrylate cross-linker cleavable under thermolysis or alkaline hydrolysis conditions: synthesis, polymerization, and degradation

A dimethacrylate cross-linker cleavable under thermolysis or alkaline hydrolysis conditions: synthesis, polymerization, and degradation

An Oxygen‐Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by UV‐Nanoimprint Lithography

A Tunable Nanoimprint System to Create New Features

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