Ion energy distributions (IEDs) and ion angular distributions (IADs) of Cl + 2 and Cl + ions in a dual-frequency capacitively coupled chlorine discharge are obtained through a particle-in-cell/Monte Carlo simulation. Since the ion transit time is less than the low-frequency period, the ions respond to the instantaneous electric field in the sheath region, which leads to bimodal IEDs for Cl + 2 and Cl + ions. When transiting the sheath, the Cl + ions experience a more collisional sheath than the Cl + 2 ions. The IADs of Cl + 2 and Cl + ions at the surface are almost anisotropic. However, a secondary peak is found in the IAD of Cl + ions, which can be ascribed to dissociative ionization reactions.Index Terms-Capacitively coupled plasma (CCP), ion angular distribution (IAD), ion energy distribution (IED), particle-in-cell (PIC) simulation.T HE dual-frequency (DF) capacitively coupled plasma (CCP) discharge is widely used in the microelectronic industry. DF CCP can achieve anisotropic etching while maintaining high plasma uniformity. The mechanism for achieving anisotropic etching is through the energetic positive ions bombarding the substrate. As for chlorine plasma, which is widely used in processing metals and semiconductors, the etching process is significantly enhanced by the bombardment of Cl + 2 and Cl + ions [1]. The positive ions are mainly produced in the plasma bulk region through electron impact ionization processes and then they are accelerated toward the surface by the electric field in the sheath region. In DF CCP, a separate control of the flux and energy of the ions reaching the surface within certain range of parameter space can be achieved [2]. The plasma density is found to be mainly proportional to the square of the high frequency while the energy of the ions is found to be proportional to the low-frequency voltage. Nevertheless, the two sources have inevitable coupling, which consequently leads to nonlinear dynamics of the discharge. Furthermore, in DF CCP discharge, the ions respond to the instantaneous electric field in the sheath region, which may Manuscript affect the energy and angular distributions of ions reaching the surface and then influence the surface process.In this paper, we investigate the ion energy distributions (IEDs) and ion angular distributions (IADs) of Cl + 2 and Cl + ions in a DF capacitively coupled chlorine discharge using a 1d-3v particle-in-cell/Monte Carlo collision (PIC/MCC) simulation [3]. The discharge is assumed to be sustained between two parallel plates of equal size. One is grounded and the other is subjected to a DF current sourcewhere f hf , f lf , J hf , and J lf are the frequency and current density of the high-and low-frequency sources, respectively.Here, we set f hf = 27.12 MHz, f lf = 2 MHz, J hf = 40 A/m 2 , and J lf = 2 A/m 2 . The phase difference between the two currents is set to be 0 at the beginning of the simulation. The gas pressure is assumed to be 10 mtorr and the gas temperature is set to be 300 K. The GEC rf reference cell is assumed for th...