Design of a beamline for soft and deep lithography on third generation synchrotron radiation source Rev. Sci. Instrum. 70, 1605 (1999); 10.1063/1.1149640Reuse of AIP Publishing content is subject to the terms at: https://publishing.aip.org/authors/rights-and-permissions. We report the main characteristics of the advanced photoelectric effect experiments beamline, operational at Elettra storage ring, featuring a fully independent double branch scheme obtained by the use of chicane undulators and able to keep polarization control in both linear and circular mode. The paper describes the novel technical solutions adopted, namely, ͑a͒ the design of a quasiperiodic undulator resulting in optimized suppression of higher harmonics over a large photon energy range ͑10-100 eV͒, ͑b͒ the thermal stability of optics under high heat load via cryocoolers, and ͑c͒ the end station interconnected setup allowing full access to off-beam and on-beam facilities and, at the same time, the integration of users' specialized sample growth chambers or modules.