1996
DOI: 10.1109/66.492813
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A control system for photolithographic sequences

Abstract: The goal of our control system is to improve the reliability, accuracy, and economy of operation of a sequence of interrelated processes. We achieve this task by using well known, rigorous statistical techniques to continuously monitor process parameters, detect out-of-control equipment, and then optimally adjust relevant machine inputs to bring the process back on target. We have implemented the supervisory control system on the photolithography sequence in the Berkeley Microfabrication Laboratory, where it h… Show more

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Cited by 38 publications
(2 citation statements)
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“…From equations (10) and (11), the relationships between the wafer and bake-plate steady-state temperatures, T w1 (∞), T w2 (∞), T p1 (∞) and T p2 (∞), are given as where…”
Section: Thermal Modellingmentioning
confidence: 99%
See 1 more Smart Citation
“…From equations (10) and (11), the relationships between the wafer and bake-plate steady-state temperatures, T w1 (∞), T w2 (∞), T p1 (∞) and T p2 (∞), are given as where…”
Section: Thermal Modellingmentioning
confidence: 99%
“…For every degree variation in wafer temperature uniformity during the baking process, CD can vary by as much as 20 nm [9]. A 9% variation in CD per 1 • C variation in temperature has been reported for a deep ultraviolet (DUV) resist [10]. Temperature uniformity control is thus an important issue in photoresist processing with stringent specifications [11].…”
Section: Introductionmentioning
confidence: 99%