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1995
DOI: 10.1016/0040-6090(95)06927-5
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A continuous electrical resistivity measurement in thin films

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Cited by 5 publications
(3 citation statements)
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“…3a). This method is similar to that used by Cvelbar et al, 11 except that all our measurements were carried out ex situ at room temperature in between oxidation tests. Additionally, the thickness of each stack was measured using an Alpha-Step profilometer.…”
Section: Methodsmentioning
confidence: 99%
“…3a). This method is similar to that used by Cvelbar et al, 11 except that all our measurements were carried out ex situ at room temperature in between oxidation tests. Additionally, the thickness of each stack was measured using an Alpha-Step profilometer.…”
Section: Methodsmentioning
confidence: 99%
“…9) Different methods for evaluation of properties and morphology of oxide films/thin films deposited by sputtering 10) on substrate and due to high temperature were studied previously using TEM, 11) SEM, 12) STM, X-ray diffractometry, 10) and microscopic four-point probe 11) etc. The measurement of resistivity/conductivity of thin films on substrate in the electronics industries by microscopic four-point probe, 13,14) atomic force microscope 15) and four wires in situ 16) are also well known because resistivity is one of the basic electrical properties of conducting films. 16) Previously, local conductivity of thin film on substrate was measured by using microscopic four-point probe through reducing probe spacing below inhomogeneous dimensions/area.…”
Section: Introductionmentioning
confidence: 99%
“…The measurement of resistivity/conductivity of thin films on substrate in the electronics industries by microscopic four-point probe, 13,14) atomic force microscope 15) and four wires in situ 16) are also well known because resistivity is one of the basic electrical properties of conducting films. 16) Previously, local conductivity of thin film on substrate was measured by using microscopic four-point probe through reducing probe spacing below inhomogeneous dimensions/area. 17,18) Therefore, current will pass through only thin film eliminating the contribution of base material from the measurement.…”
Section: Introductionmentioning
confidence: 99%