A contamination reducing method by ion beam bombardment of the specimen in high resolution electron microscopy

Characterization of focused electron beam induced carbon deposits from organic precursors

“…It has found numerous nanoscale applications, among which high-resolution etch masks [6], atomic force microscopy super-tips [7][8][9], nano-electrode supports [10], nano-junction insulator material [11], and near-field optical sensors [12]. Its mechanism has attracted much attention [13][14][15][16][17][18].…”

High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition

“…In EBID (rather than EBIED), it gives rise to sub-linear dependencies of growth rates on electron flux [24,27,31], and leads to lateral broadening of the structures grown (i.e., reduces resolution), as has been demonstrated by measurements [27] and simulations [24] of the diameters of pillars grown by stationary electron beams. In extreme cases, adsorbate depletion results in the growth of broad rings around the electron beam [26], an effect often encountered during 'contamination buildup' in electron microscopy, where precursor transport is typically dominated by the surface diffusion of residual hydrocarbon adsorbates [31][32][33][34].…”