A comprehensive study on different silicon-containing interlayers for a-C:H adhesion on ferrous alloys

Boeira, Carla D.; Leidens, Leonardo M.; Cemin, Felipe; Petry, Eigor Renato; Costa, M.E.H. Maia da; Camargo, S.S.; Michels, Alexandre F.; Figueroa, Carlos A.

doi:10.1016/j.tsf.2017.10.043

Cited by 17 publications

(5 citation statements)

References 40 publications

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“…10,19,20 For these systems using a-SiC x :H interlayers, it is reported that delamination occurs more frequently at the outermost interface due to contaminants or undesirable chemical combination, thus proposing a chemical mechanism for adhesion. 10,17,33,34 The interlayer deposition temperature, for example, is related to thermoactivated chemical reactions, where the mobility of chemical species is affected and consequently the thickness of these interlayers. Under specific temperature conditions, chemical reactions can form more stable bonds that favor adhesion such as Si−C, Si− Si, and C-C, and also release more volatile species, such as O 2 and H 2 O, that are harmful for adhesion.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

“…Spontaneous delamination of a-C and a-C:H thin films occurs when deposition parameters such as low temperatures, low bias voltages or precursors containing silicon with complex molecules are used. ,, For these systems using a-SiC x :H interlayers, it is reported that delamination occurs more frequently at the outermost interface due to contaminants or undesirable chemical combination, thus proposing a chemical mechanism for adhesion. ,,, The interlayer deposition temperature, for example, is related to thermoactivated chemical reactions, where the mobility of chemical species is affected and consequently the thickness of these interlayers. Under specific temperature conditions, chemical reactions can form more stable bonds that favor adhesion such as Si–C, Si–Si, and C-C, and also release more volatile species, such as O 2 and H 2 O, that are harmful for adhesion .…”

Section: Results and Discussionmentioning

confidence: 99%

“…This is also associated with the formation of Si-C bonds, which allows the stress relief due to the extension of the bond length, reducing the compressive stress and thermal incompatibility . Recent studies showed that Si-containing interlayers must be deposited in temperatures higher than 300 °C to guarantee suitable a-C film adhesion, which may make many industrial processes unfeasible after affecting previous substrate tempering. − Thus, the processing parameters and chemical structure of interlayers and interfaces in the nanoscale may also control the adhesion of the film onto the substrate.…”

Section: Introductionmentioning

confidence: 99%

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Adhesion of Amorphous Carbon Nanofilms on Ferrous Alloy Substrates Using a Nanoscale Silicon Interlayer: Implications for Solid-State Lubrication

Boeira

Cemin

Leidens

et al. 2022

ACS Appl. Nano Mater.

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The low adhesion of amorphous carbon (a-C) films on ferrous alloys has restricted massive industrial application since their development, restricting application to mechanical and electromechanical components. Although different mechanisms have been raised to describe the a-C film adhesion, the chemical affinity and the role of oxygen at the interfaces are the key issue. Nevertheless, a quantitative approach considering the oxygen adsorption and the adhesion strength/base pressure relationship is still not proposed, which would be of special interest in industry. In this study, we analyze the influence of the base pressure on the adhesion of amorphous carbon (a-C) films onto a ferrous alloy intermediated by a nanometric silicon interlayer. The different base pressure deposition resulted in different adhesion of the films. By means of structural and chemical techniques, the oxygen content at the interfaces was quantified and correlated with the base pressure before thin film deposition. We propose a quantitative physicochemical model that correlates the a-C film adhesion with oxygen located at the interfaces, which is indirect evidence of its previous presence in the deposition chamber, as a fraction of the residual gases from the base pressure. As adhesion depends on oxygen content, we used the Langmuir isothermal law to evaluate this dependence with good agreement. This model may be of potential interest in plasma surface engineering and process automatization not only for carbon-related materials deposited on metals, mainly in its potential use as a solid lubricant.

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Section: ■ Results and Discussionmentioning

confidence: 99%

Section: Results and Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Adhesion of Amorphous Carbon Nanofilms on Ferrous Alloy Substrates Using a Nanoscale Silicon Interlayer: Implications for Solid-State Lubrication

Boeira

Cemin

Leidens

et al. 2022

ACS Appl. Nano Mater.

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“…The surface of the metal contains some alloy elements. Under the influence of high temperature, an oxidation reaction occurs [4]. The most common high-temperature oxidation is the oxide formed by iron and oxygen.…”

Section: High Temperature Oxidation Of Weathering Steelmentioning

confidence: 99%

Study on High Temperature Oxidation Behavior of Silicon-Containing Weathering Steel

Cemin¹

2022

OAJRCMS

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Iron and steel materials are becoming more and more important in people's daily life. They are indispensable basic materials in industry. In industrial development and industrial system, iron and steel materials are the most commonly used materials in construction. The role of development is becoming more and more important. At present, steel industry has reached an advanced level in some fields, and weathering steel usually contains a lot of alloying elements, and silicon-containing weathering steel is one of them. When weathering steel is subjected to high temperature During oxidation, more complex oxidation behaviors will appear on the surface. When the weathering steel is oxidized, it means that the skin of the steel has defects, which greatly reduces the quality of the steel product. This article is to explore the high-temperature oxidation behavior of silicon-containing weathering steel, understand the mechanism of high-temperature iron oxide and propose corresponding treatment measures.

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“…Furthermore, organosilicon films are made from many precursors/methodologies and have a wide range of applications due to the combination of varied properties and the ability to change them . These films have been utilized for atomic oxygen (AO) protective coatings, , water penetration barriers, oxygen and water vapor barriers, anticorrosion protection, − biocompatible coatings, solar cells, scratch protection, adhesion promotion, etc. For instance, a 400 nm thick plasma-polymerized hexamethyldisiloxane (pp-HMDSO) film as a protective coating against AO in the space environment was recently deposited by our group on a 1.2 m wide polyimide surface using plasma-enhanced chemical vapor deposition (PECVD), which demonstrated excellent resistance to AO .…”

Section: Introductionmentioning

confidence: 99%

UV-Induced Synthesis of Hybrid HMDSO/SiO₂ Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

Li,

et al. 2023

ACS Appl. Mater. Interfaces

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A flexible, dense, defect-free, highly adhesive, and highly dissociation energy-rich protective coating is essential to enhance the atomic oxygen (AO) resistance of polymeric materials in a low Earth orbit (LEO). In this work, a dense, defect-free hybrid HMDSO/SiO 2 thin film coating with compositional gradients on the surface of polyimide was synthesized using vacuum-ultraviolet (VUV) irradiation. The effects of VUV irradiation on the morphology, optical transmittance, and chemical components of plasma-polymerized HMDSO (pp-HMDSO) thin-film coatings deposited on the polyimide surface were investigated in depth. There were no defects such as cracks and holes in the surface morphology of pp-HMDSO films after VUV irradiation, but the surface roughness increased slightly, and the corresponding optical transmittance decreased slightly. The chemical components of pp-HMDSO films were changed in the depth direction starting from the top of the surface, forming hybrid HMDSO/SiO 2 thin films with compositional gradients. The component gradient HMDSO/SiO 2 composite coating further enhanced the atomic oxygen resistance of the polyimide due to the surface layer of the UV-modified coating enriched with high dissociation energy SiO x material. Therefore, this work provides a facile UV-induced synthesis method to prepare dense, defect-free, and highly dissociation energy-rich protective gradient coatings, which are promising not only for excellent AO protection in LEO but also for potential application in water−oxygen barrier films.

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A comprehensive study on different silicon-containing interlayers for a-C:H adhesion on ferrous alloys

Cited by 17 publications

References 40 publications

Adhesion of Amorphous Carbon Nanofilms on Ferrous Alloy Substrates Using a Nanoscale Silicon Interlayer: Implications for Solid-State Lubrication

Adhesion of Amorphous Carbon Nanofilms on Ferrous Alloy Substrates Using a Nanoscale Silicon Interlayer: Implications for Solid-State Lubrication

Study on High Temperature Oxidation Behavior of Silicon-Containing Weathering Steel

UV-Induced Synthesis of Hybrid HMDSO/SiO₂ Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

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A comprehensive study on different silicon-containing interlayers for a-C:H adhesion on ferrous alloys

Cited by 17 publications

References 40 publications

Adhesion of Amorphous Carbon Nanofilms on Ferrous Alloy Substrates Using a Nanoscale Silicon Interlayer: Implications for Solid-State Lubrication

Adhesion of Amorphous Carbon Nanofilms on Ferrous Alloy Substrates Using a Nanoscale Silicon Interlayer: Implications for Solid-State Lubrication

Study on High Temperature Oxidation Behavior of Silicon-Containing Weathering Steel

UV-Induced Synthesis of Hybrid HMDSO/SiO2 Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

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Product

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UV-Induced Synthesis of Hybrid HMDSO/SiO₂ Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance