2010
DOI: 10.1016/j.jcis.2010.01.018
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A comparison between physically and chemically driven etching in the oxidation of graphite surfaces

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Cited by 40 publications
(39 citation statements)
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“…Studies show that NTPs generated from DBD devices etch surfaces through more-or-less random ion bombardment, resulting in a time-dependent physical deposition of oxygen and nitrogen species from normal atmospheric air (24). Here, we report that analogous physical damage occurs on the surface of multidrug-resistant microbes, ultimately leading to partial cell lysis and the release of intracellular components with longer treatment times.…”
Section: Discussionmentioning
confidence: 72%
See 1 more Smart Citation
“…Studies show that NTPs generated from DBD devices etch surfaces through more-or-less random ion bombardment, resulting in a time-dependent physical deposition of oxygen and nitrogen species from normal atmospheric air (24). Here, we report that analogous physical damage occurs on the surface of multidrug-resistant microbes, ultimately leading to partial cell lysis and the release of intracellular components with longer treatment times.…”
Section: Discussionmentioning
confidence: 72%
“…However, the mechanism through which NTPs inactivate living cells is poorly understood. Several plausible hypotheses exist, including oxidative intracellular/DNA damage, disruption of cellular electrostatic potential, or chemical etching of the cellular surface (24). The lack of a standard protocol for preparing and treating cells with plasma, in addition to technical limitations associated with analyzing cells on surfaces rather than in solution, represent critical impediments for determining the exact mechanism through which NTPs inactivate microbes.…”
mentioning
confidence: 99%
“…49 As in the case of hydrogen plasmas, the processing conditions for exposure of graphene to an oxygen plasma must be carefully controlled to avoid damage to the carbon lattice. In fact, attempts to measure the oxidation of graphite by an oxygen plasma have found that plasmas can etch graphite even at low exposure levels, creating single-atom vacancies and nanometer-sized pits, 5051 while additional exposure induces the formation of micro-pores. 52 This potential for irreversible lattice damage in plasma-based oxidation is enhanced by the presence of higher energy ions such as O 2 + that can sputter carbonaceous material.…”
Section: Atomic Oxygen On Graphenementioning
confidence: 99%
“…Up to now, various etching techniques including hyperthermal treatment by air or molecular oxygen, [19][20][21][22] ion bombardment, 23,24 oxygen plasma, [25][26][27][28][29][30] and wet chemical and electrochemical approaches 31 have been developed for this purpose. However, additional defects could be simultaneously introduced during the etching 25,26 due to the fast and vigorous interaction between carbon and these reactive species.…”
Section: Introductionmentioning
confidence: 99%