“…While in the linear case [30] a symmetrical mask would call for symmetrical phases and hence the number of basis functions at a given order could be reduced by selecting only even basis, in the planar case, we must distinguish patterns with a rotational symmetry, which would call for the same symmetry in the phases and hence only Z 0 n functions and nonrotationally symmetrical masks which will need, in principle, all Z m n . In practice, if the beam is rotationally symmetric but not pointing broadside, just the two Z m 1 functions, can be added since they allow for a linear phase and hence for the beam scanning to a generic (u 0 , v 0 ).…”