2011
DOI: 10.1109/lmwc.2011.2165534
|View full text |Cite
|
Sign up to set email alerts
|

A Compact V-Band Bandpass Filter in IPD Technology

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
10
0

Year Published

2014
2014
2024
2024

Publication Types

Select...
6
2

Relationship

0
8

Authors

Journals

citations
Cited by 31 publications
(10 citation statements)
references
References 12 publications
0
10
0
Order By: Relevance
“…The proposed WBBS filter is presented on the IPD platform based on transmission‐line concept of impedance ( Z ) 50 Ω, folded meandered‐line and air‐bridge structure . The design was fabricated on the GaAs substrate containing the two metal layers with the Au as a top conductive layer.…”
Section: Design and Theoretical Analysismentioning
confidence: 99%
“…The proposed WBBS filter is presented on the IPD platform based on transmission‐line concept of impedance ( Z ) 50 Ω, folded meandered‐line and air‐bridge structure . The design was fabricated on the GaAs substrate containing the two metal layers with the Au as a top conductive layer.…”
Section: Design and Theoretical Analysismentioning
confidence: 99%
“…Franc et al [3] proposed two 60 GHz filters based on dual‐behaviour resonators realised with shielded coplanar waveguide transmission lines, and implemented them by using a complementary metal–oxide–semiconductor technology. A miniaturised open‐loop resonator filter in V‐band was presented and implemented using an integrated passive device technology with a low‐loss glass substrate and thick metal layers [4]. Though these technologies have been successfully applied to implement 60 GHz filters, innovative solutions are required to reduce fabrication complexity and cost by using more mature fabrication technologies.…”
Section: Introductionmentioning
confidence: 99%
“…One of the most powerful device fabrication methods, photolithography, is widely used for miniaturized microwave devices composed of metallic lines of only a few microns wide. However, photolithography is a rather complicated process, even for creating a few samples with simple structural designs [1,2].…”
Section: Introductionmentioning
confidence: 99%