A compact UHV deposition system for in situ study of ultrathin films via hard x-ray scattering and spectroscopy

Abstract

We report on a compact ultrahigh vacuum deposition system developed for in situ experiments using hard x rays. The chamber can be mounted on various synchrotron beamlines for spectroscopic as well as scattering experiments in grazing incidence geometry. The deposition process is completely remotely controlled and an ellipsometer is available for online monitoring of the layer growth process. The unique sample position in the chamber allows one to perform deposition, grazing incidence x-ray experiments, and ellipsometry measurements at the same time, enabling to correlate the x-ray analysis with parameters of the growth process. Additionally, the setup can be used to study in situ chemical and structural changes in an element specific manner by x-ray absorption spectroscopy. The flexibility and versatility of the system brings new possibilities to study the chemistry and structure of surfaces and interfaces in thin films systems during their formation.

A portable molecular beam epitaxy system for in situ x-ray investigations at synchrotron beamlines

“…Thus avoiding the unfavorable edge effects of the scattered and reflected beams. 10 Figure 2 shows a view of a sample mounted on the manipulator. The sample is seen at different temperatures and from different view ports.…”

“…[7][8][9][10][11][12][13][14][15][16] In principle, these concepts can be separated to two general philosophies. a) Taras.Slobodskyy@physik.uni-hamburg.de.…”

Selective Doping of Block Copolymer Nanodomains by Sputter Deposition of Iron

“…We used a portable UHV system equipped with a dc magnetron sputtering source and two beryllium windows enabling simultaneous in-situ GISAXS experiments on the thin polymer film template during sputter deposition of iron. 41,46,47 A schematic side view of the sputtering chamber used for this investigation is shown in Figure 1. The main chamber was pumped down by a two-stage turbomolecular pump to a base pressure lower than 5 Â 10 -8 mbar.…”

Morphology of the interfaces between transition metals and their native oxides: Role of interdiffusion processes

“…The in-situ x-ray absorption experiments were carried out in a dedicated ultrahigh-vacuum deposition system 13 mounted on the A1 beamline of the DORIS III storage ring ͑Hamburg, Germany͒. The base pressure was 1 ϫ 10 −9 mbar.…”