2016
DOI: 10.1109/ted.2016.2564424
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A Compact Subthreshold Model for Short-Channel Monolayer Transition Metal Dichalcogenide Field-Effect Transistors

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Cited by 27 publications
(32 citation statements)
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“…Here, based on the high quality continuous MoS2 film we previously reported [65][66][67] (Fig. 3b, also see Moreover, the implementation of high-performance analog circuits requires device modeling with higher accuracy [72][73][74] . For our MoS2 FETs, we established a device model with analytic equations and a level-62 SPICE model, whose results are consistent with the experimental results (also see SI).…”
Section: Wafer-scale Mos2 Film Synthesis and Device Processingmentioning
confidence: 77%
See 1 more Smart Citation
“…Here, based on the high quality continuous MoS2 film we previously reported [65][66][67] (Fig. 3b, also see Moreover, the implementation of high-performance analog circuits requires device modeling with higher accuracy [72][73][74] . For our MoS2 FETs, we established a device model with analytic equations and a level-62 SPICE model, whose results are consistent with the experimental results (also see SI).…”
Section: Wafer-scale Mos2 Film Synthesis and Device Processingmentioning
confidence: 77%
“…3g. In the following section in this paper, we show how MoS2 can be used to build complex digital and analog circuits for AI computation, which is a major step forward beyond laboratory-level 2DLM devices 1,72,73 .…”
Section: Wafer-scale Mos2 Film Synthesis and Device Processingmentioning
confidence: 99%
“…Several physical-based analytical models [7]- [9] have been proposed for current-voltage (I-V) characteristics of TMD FETs based on the drift-diffusion picture, without applicability to the ballistic and quasi-ballistic regimes [10]- [12]. To perform the ballistic transport effect, some compact models for short-channel devices [10], [11] were proposed but only for the subthreshold region. Furthermore, the work of [12] used an improved method of traditional virtual source (VS) model [13] and made the long-channel device models continue to work well at the nanoscale.…”
Section: Introductionmentioning
confidence: 99%
“…have developed short channel models for However, in [10], [11], authors have developed the framework for analyzing short channel effects in 2 − D material FETs using generalized scale length approach. Subthreshold I-V model for short-channel TMDFETs is proposed in [7].…”
Section: Introductionmentioning
confidence: 99%
“…Work in [8] does'nt include the impact of back gate fringing field effects, and is only applicable for symmetric TMD FET. In [7], although it claims it includes the fringing field effect but it includes the effect using fitting parameter which underestimates the impact and is only validated with drift diffusion based simulator. • The developed model is validated using NEGF based simulator, NanoTCAD ViDES [13] and Experimental data [14].…”
Section: Introductionmentioning
confidence: 99%