A chemical kinetic study of the oxidation of silane by nitrous oxide, nitric oxide and oxygen

Mével, Rémy; Javoy, S.; Dupré, G.

doi:10.1016/j.proci.2010.05.076

Cited by 41 publications

(16 citation statements)

References 18 publications

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“…The chemical kinetic model used in the present study consists of 203 reactions and 32 species [24,3]. It was mainly based on the Konnov [40] and Mueller et al [41] mechanisms.…”

Section: Kinetic Modelingmentioning

confidence: 99%

“…It is also important for silane oxidation by nitrous oxide [2,3] because the thermal decomposition of silane is faster than that of nitrous oxide and results in the release of molecular hydrogen [4]. Silane-nitrous oxide mixtures are widely used in the semi-conductor industry [5] in order to form insulator or protective layers [6,7,8,9] in a wide variety of applications [10,11,12].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Detonation in hydrogen–nitrous oxide–diluent mixtures: An experimental and numerical study

Mével

Davidenko

Lafosse

et al. 2015

Combustion and Flame

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“…The chemical kinetic model used in the present study consists of 203 reactions and 32 species [24,3]. It was mainly based on the Konnov [40] and Mueller et al [41] mechanisms.…”

Section: Kinetic Modelingmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Detonation in hydrogen–nitrous oxide–diluent mixtures: An experimental and numerical study

Mével

Davidenko

Lafosse

et al. 2015

Combustion and Flame

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“…From these fundamental perspectives, it is therefore clear that the understanding of the interactions between N 2 O and the H 2 /O 2 system is important. From practical perspectives, because SiH 4 decomposes (by releasing H 2 ) faster than N 2 O [7], the H 2 /N 2 O system also plays an important role in SiH 4 /N 2 O chemistry, a system of interest and of concern for safety-related issues for the semiconductor and the ceramic material production industries [8,9]. Other safety-related issues such as the release of gaseous mixtures mainly composed of H 2 and nitrous oxide from nuclear waste [10e12] or the planning for a future hydrogen economy [13,14] can also be mentioned.…”

Section: Introductionmentioning

confidence: 99%

Effects of N2O addition on the ignition of H2–O2 mixtures: Experimental and detailed kinetic modeling study

Mathieu

Levacque

Petersen

2012

International Journal of Hydrogen Energy

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“…The activation energy corresponds to 6.9 kJ/mol at 298 K. Mével et al . reported a chemical kinetic study for the oxidation of silane with N 2 O, NO, and O 2 by using shock waves at temperatures between 1725 and 2584 K and pressures from 231 to 601 kPa 9a,b . They suggested that the oxygen atom reaction was the important process in the oxidation of SiH 4 and that additional experimental data would be necessary for a precise description of the dynamics of silane‐based mixtures.…”

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confidence: 99%

Arrhenius Parameters of the Bimolecular Reaction of SiH₄ with O(³P) Atom over a Temperature Range of 294.7–378.5 K

Yoo

2015

Bulletin Korean Chem Soc

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The reaction of ground state oxygen atom with silane, SiH 4 + O( 3 P), has been studied for the past three decades because of its important role in semiconductor fabrication processes. The reaction is essential for understanding the process in chemical vapor deposition (CVD) using oxygen and silane to form SiO 2 layers. The film thickness in deposition of SiO 2 in a SiH 4 /O 2 -inductive coupled plasma (ICP) system is controlled by the gas flow rate. The relationship between oxygen atom density, which contributes directly to the deposition of SiO 2 , and the gas flow rate was reported by Tong. Moreover, recently enormous amounts of silane have been consumed by semiconductor-related industries for solar cells, glass fiber coating, and bio-inert layers on titanium implants. The discharge of silane into the atmosphere is one of the main safety problems that needs to be solved by the semiconductor industry.2 During industrial processes, a large amount of silane is released into the atmosphere and it is explosive in air at a concentration of only about 1%. Silane is a pyrophoric and highly flammable gas, and a mixture of silane and air produces a spontaneous combustion reaction at room temperature without a source of ignition. Babushok et al. studied self-ignition and flame propagation of silane by computer simulation using kinetic and thermodynamic data; 3 however, the kinetic behavior of silane with oxygen atoms is not understood clearly, and the kinetic data are widely dispersed depending on the experimental techniques. 9a,b They suggested that the oxygen atom reaction was the important process in the oxidation of SiH 4 and that additional experimental data would be necessary for a precise description of the dynamics of silanebased mixtures.In our laboratory, the reaction SiH 4 + O( 3 P) was studied and the rate constant was determined to be k = (1.38 AE 0.06) × 10 −13 cm 3 /molecule/s at 298 K. 10a A temperature dependence study over a temperature range of 313-356 K indicated the possibility of negative apparent activation energy; however, the temperature range was too narrow to obtain reliable Arrhenius parameters. Results and DiscussionThe triplet state oxygen atoms, O( 3 P), are consumed by the following processes:The consumption rate of O( 3 P) iswhere k wall is for the reaction by the wall or other third body molecules. The reaction rates were determined near the starting point of the reaction and the reactions were carried out under pseudofirst order conditions for oxygen atom.

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A chemical kinetic study of the oxidation of silane by nitrous oxide, nitric oxide and oxygen

Cited by 41 publications

References 18 publications

Detonation in hydrogen–nitrous oxide–diluent mixtures: An experimental and numerical study

Detonation in hydrogen–nitrous oxide–diluent mixtures: An experimental and numerical study

Effects of N2O addition on the ignition of H2–O2 mixtures: Experimental and detailed kinetic modeling study

Arrhenius Parameters of the Bimolecular Reaction of SiH₄ with O(³P) Atom over a Temperature Range of 294.7–378.5 K

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A chemical kinetic study of the oxidation of silane by nitrous oxide, nitric oxide and oxygen

Cited by 41 publications

References 18 publications

Detonation in hydrogen–nitrous oxide–diluent mixtures: An experimental and numerical study

Detonation in hydrogen–nitrous oxide–diluent mixtures: An experimental and numerical study

Effects of N2O addition on the ignition of H2–O2 mixtures: Experimental and detailed kinetic modeling study

Arrhenius Parameters of the Bimolecular Reaction of SiH4 with O(3P) Atom over a Temperature Range of 294.7–378.5 K

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Arrhenius Parameters of the Bimolecular Reaction of SiH₄ with O(³P) Atom over a Temperature Range of 294.7–378.5 K