1998
DOI: 10.1109/77.712140
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A 5-μm-wide 18-cm-long low-loss YBa/sub 2/Cu/sub 3/O/sub 7-δ/ coplanar line for future multichip module technology

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Cited by 4 publications
(1 citation statement)
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“…We choose a maximal loop area allowed by fabrication technology A = (8 mm) 2 . We anticipate that reaching a significant α k is the main bottleneck: The reported values 16 of the YBCO λ in the low-T limit are only 150 − 200 nm, and few devices have previously featured long superconducting traces with a small cross-section 17 . We select a conservative value of w = 10 µm, and compare devices with a variable d ≤ 225 nm.…”
mentioning
confidence: 99%
“…We choose a maximal loop area allowed by fabrication technology A = (8 mm) 2 . We anticipate that reaching a significant α k is the main bottleneck: The reported values 16 of the YBCO λ in the low-T limit are only 150 − 200 nm, and few devices have previously featured long superconducting traces with a small cross-section 17 . We select a conservative value of w = 10 µm, and compare devices with a variable d ≤ 225 nm.…”
mentioning
confidence: 99%