2008
DOI: 10.1007/s00339-007-4394-x
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A 14-ps full width at half maximum high-speed photoconductor fabricated with intersecting InP nanowires on an amorphous surface

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Cited by 50 publications
(30 citation statements)
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“…6(b) is an SEM top-view image collected on a representative InP nanowire photoconductor consisting of a pair of metal ohmic electrodes (labeled E1 and E2) in a coplanar configuration that allows us to perform high-speed testing [24,25]. The two n + mc-Si:H segments were entirely covered by InP nanowires, whereas very few nanowires were observed elsewhere even though the Au nanoparticles were dispersed uniformly over the entire surface.…”
Section: Inp Nanowire Photoconductorsmentioning
confidence: 99%
“…6(b) is an SEM top-view image collected on a representative InP nanowire photoconductor consisting of a pair of metal ohmic electrodes (labeled E1 and E2) in a coplanar configuration that allows us to perform high-speed testing [24,25]. The two n + mc-Si:H segments were entirely covered by InP nanowires, whereas very few nanowires were observed elsewhere even though the Au nanoparticles were dispersed uniformly over the entire surface.…”
Section: Inp Nanowire Photoconductorsmentioning
confidence: 99%
“…Based on a similar approach, we demonstrated an ultrafast photoconductor on silicon dioxide substrate with a response above 30 GHz [22]. Chueh et al grew Ge NWs directly on lowtemperature substrates, including plastics and rubber [145].…”
Section: A Review Of Various Nw Pds 1) Nw Pds Via Direct Growthmentioning
confidence: 99%
“…Over the last ten years or more, parallel developments and advances in the "bottom-up" synthesis of 1-dimensional NWs (1-D-NWs) with precise control on the chemical compositions, morphologies, and sizes have enabled researchers to fabricate novel nanodevices, such as NW FETs (NWFETs) [10]- [13], LEDs [14], [15], complimentary inverters [16], complex logic gates [17], lasers [18], chemical sensors [19]- [21], and PDs [22]. Simultaneously, the current state-of-the-art silicon CMOS technology has already been scaled down to nanometer feature sizes and is approaching the physical lower limit of beneficial scaling.…”
Section: A New Material-nanowiresmentioning
confidence: 99%
“…Based on a similar approach, we demonstrated an ultrafast photoconductor on a silicon dioxide substrate with a response above 30 GHz [17]. Various heterogeneous transfer techniques have been pursued by Rogers et al who have demonstrated the transfer of microstructured singlecrystalline silicon ribbons from a silicon-on-insulator substrate using polydimethylsiloxane (PDMS) and a soft-lithography process to remove structures that were fabricated via a planar 2-D dry-or wet-etching process [40], [44], [46], [51], [52].…”
Section: < 220mentioning
confidence: 99%