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Babayan, S E; Ding, Ge; Hicks, Robert F.

doi:10.1023/a:1012094817122

Cited by 51 publications

(62 citation statements)

References 23 publications

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“…The water molecules gotten energy could form Á OH and H 2 O 2 through the reaction (4) and (5). At the same time, the gas molecules in the discharge region were dissociated or excited by high-energy electrons to form gas plasma [23][24][25][26][27][28]:…”

Section: Resultsmentioning

confidence: 99%

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Formations of Active Species and By-Products in Water by Pulsed High-Voltage Discharge

Bian

Zhou

Lei

2007

Plasma Chem Plasma Process

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Formations of active species and by-products are different from bubbling different gases in a pulsed high-voltage discharge reactor. The identification of all the products and the formation rate determination of active species are quite important as the process is applied to wastewater disposal. Serials of measurements were conducted to do the identifications and determinations in this paper. Amounts of Á OH all increased but that of H 2 O 2 all decreased by bubbling gas. The Á OH formation rate was 3.49 · 10 À7 , 3.56 · 10 À7 , 3.21 · 10 À7 and 1.94 · 10 À7 mol l À1 s À1 with bubbling nitrogen, argon, air and oxygen respectively, but it was 1.61 · 10 À7 mol s À1 l À1 without bubbling. Without any bubbling, the H 2 O 2 formation rate was up to 6.53 · 10 À6 mol l À1 s À1 , while it was 9.97 · 10 À7 , 1.663 · 10 À7 , 1.73 · 10 À6 and 3.14 · 10 À6 mol l À1 s À1 with bubbling nitrogen, argon, air and oxygen, respectively. NO 2 À and NO 3 À was detected in discharged water with bubbling nitrogenous gas. Their formation made the pH decreased.

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Section: Resultsmentioning

confidence: 99%

“…Because the slim gas flow was surrounded by water, the excited species were trapped immediately by the water molecules [23][24][25][26][27][28]:…”

Section: Resultsmentioning

confidence: 99%

Formations of Active Species and By-Products in Water by Pulsed High-Voltage Discharge

Bian

Zhou

Lei

2007

Plasma Chem Plasma Process

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“…Under atmospheric pressure, the charged particle density decays very rapidly in the afterglow, whereas the atoms and radicals generated by the plasma are relatively long lived. [60,65,73] The chemical precursor reacts with the atoms and radicals, and then impinges on the substrate and deposits the thin film. …”

Section: Plasma Source Designmentioning

confidence: 99%

“…[65,67,71] The apparatus used in these experiments consists of two parallel metal plates separated by a gap of 1.6 mm. Helium, and oxygen or nitrogen, flow through these electrodes and are ionized with RF power at 13.…”

Section: Discharge Chemistrymentioning

confidence: 99%

Atmospheric Plasma Deposition of Coatings Using a Capacitive Discharge Source

Moravej

Hicks

2005

Chemical Vapor Deposition

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In this paper, a review is provided of the plasma-enhanced (PE)CVD of thin films using an atmospheric-pressure (AP) capacitive discharge source. This source is unique in that the organometallic precursors are fed downstream of the plasma, where reactions occur exclusively between neutral molecules, radicals, and the substrate surface. As a result, the properties of the films differ from those obtained in low-pressure (<1 torr) gas discharges. For example, glass may be deposited on plastic with no carbon contamination and less than 15 mol-% hydroxyl groups, yielding material with good scratch protection. Silicon nitride and amorphous hydrogenated silicon films have also been prepared by AP-PECVD. These material processes further illustrate the unique attributes of this new deposition technology.

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“…On the basis of earlier investigations [21][22][23] it was shown that N ( 4 S) atoms formed in previous discharge have a very large recombination time. Catalytic recombination of these atoms on the cathode leads to formation of N 2 (B) molecules [24,25]. Spontaneous de-excitation N 2 (B) molecules leads to formation of N 2 (A) metastable molecules [26].…”

Section: The Influence Of Afterglow Period and Overvoltage On Electrimentioning

confidence: 99%

Analysis of statistical nature of electrical breakdown time delay in nitrogen at 6.6 mbar pressure in presence of positive ions and N(⁴S) atoms

Živanović

Pejović

Nesic

2011

Contrib. Plasma Phys.

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Key words Electrical breakdown time delay, breakdown voltage, afterglow period, neutral active states.On the basis of the mean value of electrical breakdown time delay t d and the standard deviation of electrical breakdown time delay σ dependence on the afterglow period τ , the mechanisms which dominantly influence to breakdown initiation in nitrogen were separated. It was shown that the positive ions formed in mutual collision of long-lived metastable molecules have a dominant role in breakdown initiation for τ values up to 70 ms. The metastable molecules were derived from previous breakdown and discharge. In this case σ t d and the total time delay t d is approximately equal to formative time t f which decreases in value with the increase of overvoltage. When positive ions have a dominant role in the breakdown initiation the Gaussian distribution describes data of t d ≈ t f very well. For τ > 1 s, N ( 4 S) atoms formed in previous breakdown and discharge, have a dominant role in the breakdown initiation. Then, σ ≈ t d and Laue's distribution, which is valid for statistical time delay ts, describes t d data very well.

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Untitled

Cited by 51 publications

References 23 publications

Formations of Active Species and By-Products in Water by Pulsed High-Voltage Discharge

Formations of Active Species and By-Products in Water by Pulsed High-Voltage Discharge

Atmospheric Plasma Deposition of Coatings Using a Capacitive Discharge Source

Analysis of statistical nature of electrical breakdown time delay in nitrogen at 6.6 mbar pressure in presence of positive ions and N(⁴S) atoms

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Untitled

Cited by 51 publications

References 23 publications

Formations of Active Species and By-Products in Water by Pulsed High-Voltage Discharge

Formations of Active Species and By-Products in Water by Pulsed High-Voltage Discharge

Atmospheric Plasma Deposition of Coatings Using a Capacitive Discharge Source

Analysis of statistical nature of electrical breakdown time delay in nitrogen at 6.6 mbar pressure in presence of positive ions and N(4S) atoms

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Analysis of statistical nature of electrical breakdown time delay in nitrogen at 6.6 mbar pressure in presence of positive ions and N(⁴S) atoms