1999
DOI: 10.1023/a:1008794202103
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Cited by 58 publications
(20 citation statements)
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“…In contrast, thin film growth methods typically involve deposition on oxidized silicon wafers (the oxide layer on the silicon providing the lower cladding layer) or other substrates, thus potentially allowing for integration with other devices on the same substrate and fabrication of devices over a large area. Methods which have been utilized for depositing Er-doped waveguiding films include atomic layer deposition [129,151], dip-coating [152], flame hydrolysis [32,153], high vacuum chemical vapour deposition (HV-CVD) [154], plasma-enhanced chemical vapour deposition (PECVD) [83,127,138,[155][156][157], pulsed laser deposition (PLD) [59,126,145,[158][159][160][161][162][163], reactive cosputtering [68,84,87,128,[164][165][166], RF-sputtering [40,98,131,133,137,[167][168][169][170], the sol-gel method [134,[171][172][173][174][175]…”
Section: Waveguide Fabrication Methodsmentioning
confidence: 99%
“…In contrast, thin film growth methods typically involve deposition on oxidized silicon wafers (the oxide layer on the silicon providing the lower cladding layer) or other substrates, thus potentially allowing for integration with other devices on the same substrate and fabrication of devices over a large area. Methods which have been utilized for depositing Er-doped waveguiding films include atomic layer deposition [129,151], dip-coating [152], flame hydrolysis [32,153], high vacuum chemical vapour deposition (HV-CVD) [154], plasma-enhanced chemical vapour deposition (PECVD) [83,127,138,[155][156][157], pulsed laser deposition (PLD) [59,126,145,[158][159][160][161][162][163], reactive cosputtering [68,84,87,128,[164][165][166], RF-sputtering [40,98,131,133,137,[167][168][169][170], the sol-gel method [134,[171][172][173][174][175]…”
Section: Waveguide Fabrication Methodsmentioning
confidence: 99%
“…The 1.53 mm PL intensity for the erbium organic complexes in bulky powder increases in the order Er(H-FA) 3 Á 2H 2 Oo Er(HFA) 4 Ko Er(HFA) 3 (TPPO) 2 . VTES-derived ORMOSIL films directly doped with various erbium organic complexes are prepared through a multistep sol-gel process, among which VTES-derived film doped with Er (H-FA) 3 (TPPO) 2 exhibits the maximum PL intensity at 1.53 mm as the erbium doping concentration is 5 mol%.…”
Section: Resultsmentioning
confidence: 96%
“…Hereon, great effort is devoted to the realization of an erbium-activated planar optical waveguide amplifier in the photonic integrated circuit, namely an erbium-doped waveguide amplifier (EDWA) [2][3][4][5][6][7][8][9][10][11][12][13][14][15][16]. Additionally, through the sol-gel process erbium organic complexes are proposed to incorporate into inorgani- c-organic hybrid materials or organically modified silicates (ORMOSILs) for potential applications in planar optical amplifiers, since the soft chemistry process offers several advantages for the fabrication of planar optical waveguides that are flexible, inexpensive and easy to obtain over 1 mm thickness crack-free film via the single coating process [16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Particularly OH -radicals are known to be efficient Er 3+ -luminescence quenchers [45][46][47][48][49][50][51][52][53][54][55][56], because of its vibration energy and that only 2 phonons are needed to match the energy gap of the 1.5 m emission. In fact, it has been demostrated in phosphate glasses that there is a direct releationship between OH -content and the reduction of the observed luminescence lifetime [55].…”
Section: 2-optical Characterizationmentioning
confidence: 99%