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Antsiferov, V. N.; Gilev, V. G.; Karmanov, V. I.

doi:10.1023/a:1024771328905

Cited by 19 publications

(6 citation statements)

References 9 publications

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“…[59] The 441 cm À 1 band can also be assigned to β-Si 3 N 4 . [60] These findings align with the previous measurements and corroborate that the sample prepared in N 2 is a mixture of the unreacted silica precursor and silicon nitride.…”

Section: Carbothermal Reduction To Sicsupporting

confidence: 91%

Carbothermal synthesis of micron‐sized, uniform, spherical silicon carbide (SiC) particles

Feller

Rosenfeldt

Retsch

2021

Zeitschrift anorg allge chemie

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Dedicated to Prof. Dr. Josef Breu on the occasion of his 60 th birthday.Silicon carbide (SiC) particles are exciting structures because of their hardness, chemical inertness, and dielectric properties. In particular, their absorption/emission properties in the midinfrared range render them suitable structures for ambient temperature thermal emitters. However, the synthesis of uniform, spherical structures is still challenging. Here, we present a robust synthesis procedure based on carbothermal reduction of silica precursor particles. With an isotropic shrinkage of ~30 %, the spherical particle shape and uniformity are retained. Furthermore, we outline the influence of the gas atmosphere during the carbothermal treatment and demonstrate the successful conversion to SiC by electron microscopy, X-ray diffraction, thermal and optical analysis.

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Section: Carbothermal Reduction To Sicsupporting

confidence: 91%

Carbothermal synthesis of micron‐sized, uniform, spherical silicon carbide (SiC) particles

Feller

Rosenfeldt

Retsch

2021

Zeitschrift anorg allge chemie

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“…Nowadays it is widely used in micro- and nanoelectromechanical systems (MEMS and NEMS) . Silicon nitride has excellent fracture toughness and is chemically inert, which presents opportunities for micro/nano devices with high corrosion resistance and high mechanical strength, as alternatives to silicon-based devices . Among other possibilities, this enables the fabrication of microsieves with high porosity and highly homogeneous pore-size distributions .…”

Section: Introductionmentioning

confidence: 99%

“…45 Silicon nitride has excellent fracture toughness and is chemically inert, which presents opportunities for micro/nano devices with high corrosion resistance and high mechanical strength, as alternatives to silicon-based devices. 46 Among other possibilities, this enables the fabrication of microsieves with high porosity and highly homogeneous pore-size distributions. 47 Microsieves therefore have a high flux and excellent selectivity in microfractionation processes.…”

Section: Introductionmentioning

confidence: 99%

Stable Protein-Repellent Zwitterionic Polymer Brushes Grafted from Silicon Nitride

et al. 2011

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Zwitterionic poly(sulfobetaine acrylamide) (SBMAA) brushes were grafted from silicon-rich silicon nitride (SixN4, x > 3) surfaces by atom transfer radical polymerization (ATRP) and studied in protein adsorption experiments. To this aim ATRP initiators were immobilized onto SixN4 through stable Si-C linkages via three consecutive reactions. A UV-induced reaction of 1,2-epoxy-9-decene with hydrogen-terminated SixN4 surfaces was followed by conversion of the epoxide with 1,2-ethylenediamine resulting in primary and secondary amine-terminated surfaces. A reaction with 2-bromoisobutyryl bromide led to ATRP initiator-covered surfaces. Zwitterionic polymer brushes of SBMAA were grown from these initiator-coated surfaces (thickness ∼30 nm), and the polymer-coated surfaces were characterized in detail by static water contact angle measurements, X-ray photoelectron spectroscopy (XPS), and an atomic force microscope (AFM). The adsorption of proteins onto zwitterionic polymer coated surfaces was evaluated by in situ reflectometry, using a fibrinogen (FIB) solution of 0.1 g·L(-1), and compared to hexadecyl-coated SixN4 surfaces (C16-SixN4), uncoated air-based plasma oxidized SixN4 surfaces (SiOy-SixN4), and hexa(ethylene oxide)-coated SixN4 surfaces (EO6-SixN4). Excellent protein repellence (>99%) was observed for these zwitterionic polymer-coated SixN4 surfaces during exposure to FIB solution as compared to C16-SixN4 surfaces. Furthermore, the stability of these zwitterionic polymer-coated SixN4 surfaces was surveyed by exposing the surfaces for 1 week to phosphate buffered saline (PBS) solution at room temperature. The zwitterionic polymer-coated SixN4 surfaces before and after exposure to PBS solution were characterized by XPS, AFM, and water contact angle measurements, and their protein-repelling properties were evaluated by reflectometry. After exposure to PBS solution, the zwitterionic polymer coating remained intact, and its thickness was unchanged within experimental error. No hydrolysis was observed for the zwitterionic polymer after 1 week exposure to PBS solution, and the surfaces still repelled 98% FIB as compared to C16-SixN4 surfaces, demonstrating the long-term efficiency of these easily prepared surface coatings.

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“…Films of this material inhibit diffusion of water, oxygen, and sodium ions, and are widely used as a passivation layer in integrated circuits . Its popularity is mainly motivated by its superior physical and chemical inertness, as it provides an excellent alternative to silicon dioxide in microelectronic and membrane applications. − …”

Section: Introductionmentioning

confidence: 99%

Covalent Biofunctionalization of Silicon Nitride Surfaces

Arafat¹,

Giesbers²,

Rosso³

et al. 2007

Langmuir

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Covalently attached organic monolayers on etched silicon nitride (SixN4; x >/= 3) surfaces were prepared by reaction of SixN4-coated wafers with neat or solutions of 1-alkenes and 1-alkynes in refluxing mesitylene. The surface modification was monitored by measurement of the static water contact angle, XPS, IRRAS, AFM, and ToF-SIMS, and evidence for the formation of Si-C bonds is presented. The etching can be achieved by dilute HF solutions and yields both Si-H and N-H moieties. The resulting etched SixN4 surfaces are functionalized by terminal carboxylic acid groups in either of two ways: (a) via attachment of a 10-undecenoic acid 2,2,2-trifluoroethyl ester (trifluoro ethanol ester) and subsequent thermal acid hydrolysis; (b) through attachment of a photocleavable ester, and subsequent photochemical cleavage, as this would allow photopatterned functionalized SixN4. The carboxylic acids are successfully used for the attachment of oligopeptides (aspartame) and complete proteins using EDC/NHS chemistry. Finally, an amino-terminated organic monolayer can be formed by reaction of HF-treated SixN4 surfaces with a N-(omega-undecylenyl)phthalimide, which yields an amino-terminated surface upon deprotection with hydrazine.

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Cited by 19 publications

References 9 publications

Carbothermal synthesis of micron‐sized, uniform, spherical silicon carbide (SiC) particles

Carbothermal synthesis of micron‐sized, uniform, spherical silicon carbide (SiC) particles

Stable Protein-Repellent Zwitterionic Polymer Brushes Grafted from Silicon Nitride

Covalent Biofunctionalization of Silicon Nitride Surfaces

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