Integrated Photonics Research and Applications/Nanophotonics for Information Systems 2005
DOI: 10.1364/ipra.2005.iwf2
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980 nm DBR Lasers Monolithically Integrated with EA Modulators for Optical Interconnect Applications

Abstract: Short-cavity InGaAs/GaAs/AlGaAs lasers with first order DBRs and integrated EAMs were fabricated using a quantum well intermixing process. >5mW output was achieved at 45mA. DC extinction was >15dB at-1.5V with efficiencies up to 20dB/V.

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Cited by 4 publications
(6 citation statements)
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“…We have previously demonstrated short-cavity DBR lasers integrated with EAMs that can be formed in dense arrays [5,6]. The integrated DBR-laser=EAM-transmitter consists of five sections: rear absorber, rear DBR mirror, gain section, front DBR mirror and EAM, followed by a curved output waveguide for low back reflection, as shown in the schematic diagram in Fig.…”
Section: Device Structurementioning
confidence: 99%
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“…We have previously demonstrated short-cavity DBR lasers integrated with EAMs that can be formed in dense arrays [5,6]. The integrated DBR-laser=EAM-transmitter consists of five sections: rear absorber, rear DBR mirror, gain section, front DBR mirror and EAM, followed by a curved output waveguide for low back reflection, as shown in the schematic diagram in Fig.…”
Section: Device Structurementioning
confidence: 99%
“…The passive and EAM band-edge was detuned from the active and lasing band-edge by $25 nm. Details of the device structure and process can be found in [5,6]. Results: The DBR laser had a threshold current of 11 mA and demonstrated output powers up to 2.5 mW.…”
Section: Device Structurementioning
confidence: 99%
“…We have previously demonstrated short-cavity DBR lasers integrated with EAMs [5,6]. The integrated DBR laser-EAM consists of 5 sections: rear absorber, rear DBR mirror, gain section, front DBR mirror, and EAM, followed by a curved output waveguide for low back reflection, as shown in the side-view schematic of Fig.…”
Section: Devicementioning
confidence: 99%
“…The passive and EAM band-edge was detuned from the active and lasing band-edge by ~25 nm. Details of the device structure and process can be found in [5,6].…”
Section: Devicementioning
confidence: 99%
“…The upper waveguide also includes a GaAs regrowth layer followed by a sacrificial InGaP layer. An impurity-free quantum well intermixing process described in [5] was used to monolithically integrate high-speed QW-EAMs with the DBR laser. Selective intermixing of the EAM, DBR, and passive regions of the device was achieved by depositing SiO 2 followed by a rapid thermal anneal (RTA) at 850°C.…”
Section: Devicementioning
confidence: 99%