Quantum dot (QD) based memories offer new functionalities as compared to present main stream ones by combining the advantages of DRAM (fast access and write/erase time, good endurance) and Flash memories (long storage time). The present storage times in such memories are demonstrated to be several days at room temperature for GaP-based devices, while write times as short as picoseconds are possible. There exists however a trade-off between storage time and erase time. To eliminate this trade-off, resonant tunneling effects in single or double quantum well structures are studied here as a promising approach. The quantum well structures based on GaAs/ Al 0.9 Ga 0.1 As and GaP/AlP quantum wells inserted in QD-based memories are designed and simulated using a Schrödinger-Poisson solver and nonequilibrium Green's functions (NEGF) to calculate the transparency at a given voltage. By choosing the width of the quantum wells, precise positioning of their energy levels allows for transparency engineering. Our simulations show an increase in transparency by at least 7 orders of magnitude at resonance, leading indeed to sufficiently fast erase times, thus solving the trade-off problem.