“…Our result agrees with [1], where it was shown that the chemical composition of the surface stabilized at oxygen deposition doses of ~300 L. In [2], stabiliza tion of the chemical content corresponded to oxygen deposition doses of no more than 3 L from the residual atmosphere. The authors of [2] explained this consid erable contradiction of the literature data by noting that under low partial pressure, oxygen can be supplied to the oxidizing area not only via deposition from the residual atmosphere, but by other mechanisms as well, e.g., due to the diffusion of oxygen atoms from areas on the surface of the sample beyond the zone of ionic etching. In our case, as was mentioned above, the effect of the electron probe and oxygen from untreated areas on the surface was not considered.…”