2000
DOI: 10.1023/a:1009486615346
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Cited by 15 publications
(8 citation statements)
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“…Thus, thymol dissolved in oleic acid presents two bands centered at 379 and 435 nm. The appearance of two emission bands may be ascribed to the formation of thymol clusters, in agreement with results found for other aromatic alcohols [33].…”
Section: Understanding the Solubilization Process Of Thymolsupporting
confidence: 90%
“…Thus, thymol dissolved in oleic acid presents two bands centered at 379 and 435 nm. The appearance of two emission bands may be ascribed to the formation of thymol clusters, in agreement with results found for other aromatic alcohols [33].…”
Section: Understanding the Solubilization Process Of Thymolsupporting
confidence: 90%
“…This can be attributed to the increase in the concentration of excited molecules and decline in the ground state population as the power density is increased up to 30 MW/cm 2 . The discussion of the phenol photolysis products is beyond the scope of this paper and is given, for example, in [16][17][18].…”
Section: Phenol and P-chlorophenol Photolysis Under Exposure To Nd-yamentioning
confidence: 99%
“…The fluorescence band with the maximum between 450-550 nm generated by photoproducts disappears after UV irradiation of phenol in the aquatic and saline solutions. We recorded this photoproduct after irradiation of phenol in the alkaline solution by the high-power XeCl-laser radiation (170 MW/cm 2 ) with an exciting radiation wavelength of 308 nm [7]. It is most likely that the nature of the product formed upon exposure to high-power laser radiation or after microbial destruction of phenol in the water solution is the same.…”
Section: Microbiological Destruction Of Nonirradiated and Irradiated mentioning
confidence: 99%
“…We have already studied the photolysis of phenol in water solutions upon exposure to UV radiation in [4][5][6]. It was shown that the photolysis of phenol in water solutions depends on the pH of the medium and the exciting radiation power and wavelength [7].…”
Section: Introductionmentioning
confidence: 99%